⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL314498 | 0.85 | — | — | |
| SCHEMBL7612472 | 0.81 | — | — | |
| Methylamine SCHEMBL28360677 | 0.79 | — | — | |
| SCHEMBL5414801 | 0.76 | — | — | |
| SCHEMBL5415618 | 0.76 | — | — | |
| SCHEMBL331353 | 0.76 | — | — | |
| SCHEMBL23928939 | 0.76 | — | — | |
| SCHEMBL21403436 | 0.76 | — | — | |
| SCHEMBL5034212 | 0.73 | — | — | |
| SCHEMBL1818838 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11739184-B2 | Polysiloxazane compound having alkoxysilyl group, process for producing same, and composition and cured product including same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-29 | — | — | US | disclosed |
| EP-3798252-B1 | POLYSILOXAZANE COMPOUND HAVING ALKOXYSILYL GROUP, PROCESS FOR PRODUCING SAME, AND COMPOSITION AND CURED PRODUCT INCLUDING SAME | SHINETSU CHEMICAL CO (JP) | 2022-06-29 | — | — | EP | disclosed |
| US-11279848-B2 | Polysilazane composition, coated substrate, and multilayer construction | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-03-22 | — | — | US | disclosed |
| US-20210095079-A1 | POLYSILOXAZANE COMPOUND HAVING ALKOXYSILYL GROUP, PROCESS FOR PRODUCING SAME, AND COMPOSITION AND CURED PRODUCT INCLUDING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-04-01 | — | — | US | disclosed |
| EP-3798252-A1 | POLYSILOXAZANE COMPOUND HAVING ALKOXYSILYL GROUP, PROCESS FOR PRODUCING SAME, AND COMPOSITION AND CURED PRODUCT INCLUDING SAME | Shin-Etsu Chemical Co., Ltd. (JP) | 2021-03-31 | — | — | EP | disclosed |
| US-20210062040-A1 | POLYSILAZANE COMPOSITION, COATED SUBSTRATE, AND MULTILAYER CONSTRUCTION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-03-04 | — | — | US | disclosed |
| EP-3546498-B1 | POLYSILAZANE COMPOSITION, COATED SUBSTRATE, AND MULTILAYER CONSTRUCTION | SHINETSU CHEMICAL CO (JP) | 2020-10-07 | — | — | EP | disclosed |
| EP-3546498-A1 | POLYSILAZANE COMPOSITION, COATED SUBSTRATE, AND MULTILAYER CONSTRUCTION | Shin-Etsu Chemical Co., Ltd. (JP) | 2019-10-02 | — | — | EP | disclosed |
| US-7205338-B2 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-04-17 | — | — | US | disclosed |
| US-20040180222-A1 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. | 2004-09-16 | — | — | US | disclosed |