Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 3/20 | 0.48 |
| ▸ | GAA | P10253 | 1/20 | 0.48 |
| ▸ | HTT | P42858 | 1/20 | 0.48 |
| ▸ | CA2 | P00918 | 3/20 | 0.46 |
| ▸ | CA5A | P35218 | 1/20 | 0.46 |
| ▸ | PRMT5 | O14744 | 1/20 | 0.44 |
| ▸ | WDR77 | Q9BQA1 | 1/20 | 0.44 |
| ▸ | MMP2 | P08253 | 2/20 | 0.43 |
| ▸ | CA1 | P00915 | 1/20 | 0.43 |
| ▸ | MMP1 | P03956 | 1/20 | 0.43 |
| ▸ | MMP9 | P14780 | 1/20 | 0.43 |
| ▸ | MMP8 | P22894 | 1/20 | 0.43 |
| ▸ | MMP13 | P45452 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | F2 | P00734 | 2/20 | 0.42 |
| ▸ | PRSS1 | P07477 | 2/20 | 0.42 |
| ▸ | PRSS2 | P07478 | 2/20 | 0.42 |
| ▸ | PRSS3 | P35030 | 2/20 | 0.42 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5409187 | 0.89 | CYP19A1 (0.38) | KMT2AGAAHTTCA2CA5A | |
| SCHEMBL5406945 | 0.86 | KMT2A (0.51) | KMT2AGAAHTTCA2CA5A | |
| SCHEMBL5403552 | 0.86 | CYP19A1 (0.40) | KMT2ACA2CA5AMMP2CA1 | |
| SCHEMBL5408367 | 0.83 | KMT2A (0.48) | KMT2AGAAHTTCA2CA5A | |
| SCHEMBL5398390 | 0.83 | KMT2A (0.48) | KMT2AGAAHTTCA2CA5A | |
| SCHEMBL5422210 | 0.81 | KMT2A (0.46) | KMT2AGAAHTTCA2CA5A | |
| SCHEMBL5409946 | 0.80 | ALDH1A1 (0.40) | KMT2AGAAMEN1ALDH1A1 | |
| SCHEMBL5405588 | 0.79 | PRMT5 (0.44) | KMT2AGAAHTTCA2CA5A | |
| SCHEMBL5398484 | 0.77 | NPSR1 (0.42) | CA2MMP2CA1MMP1MMP9 | |
| SCHEMBL5404710 | 0.75 | KMT2A (0.45) | KMT2AGAACA2MMP2CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7312014-B2 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-20040170918-A1 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2004-09-02 | — | — | US | disclosed |
| EP-1406123-A1 | RESIST COMPOSITIONS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-04-07 | — | — | EP | disclosed |