SCHEMBL5405667

SCHEMBL5405667

c1ccc2cc([C]3CC4CCC3C4)ccc2c1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC6A3 Q01959 5/20 0.56
SLC6A4 P31645 2/20 0.56
GAA P10253 1/20 0.39
KDM4E B2RXH2 1/20 0.39
NPC1 O15118 1/20 0.39
ALDH1A1 P00352 1/20 0.39
POLB P06746 1/20 0.39
MAPT P10636 1/20 0.39
RAB9A P51151 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
GSTP1 P09211 1/20 0.39
ESR1 P03372 1/20 0.39
ESR2 Q92731 1/20 0.39
ALOX5 P09917 1/20 0.38
NR1H4 Q96RI1 1/20 0.38
HSD17B1 P14061 1/20 0.37
HSD17B2 P37059 1/20 0.37
GABRA1 P14867 1/20 0.36
GABRG2 P18507 1/20 0.36
GABRB3 P28472 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6718020 0.73 SLC6A3 (0.47) SLC6A3SLC6A4GAA
SCHEMBL6718027 0.73 SLC6A3 (0.47) SLC6A3SLC6A4GAA
SCHEMBL27510781 0.68 GSTP1 (0.41) SLC6A3SLC6A4KDM4ENPC1ALDH1A1
SCHEMBL30603836 0.67 ESR1 (0.71) KDM4ENPC1ALDH1A1POLBMAPT
SCHEMBL30239993 0.67 ESR1 (0.71) KDM4ENPC1ALDH1A1POLBMAPT
SCHEMBL30239998 0.67 ESR1 (0.71) KDM4ENPC1ALDH1A1POLBMAPT
SCHEMBL5013872 0.67 ESR1 (0.71) KDM4ENPC1ALDH1A1POLBMAPT
SCHEMBL239121 0.67 ESR1 (0.71) KDM4ENPC1ALDH1A1POLBMAPT
SCHEMBL15902840 0.67 ESR1 (0.71) KDM4ENPC1ALDH1A1POLBMAPT
SCHEMBL31039575 0.65 ESR1 (0.76) KDM4ENPC1ALDH1A1POLBMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7192684-B2 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-03-20 US disclosed
US-20040067436-A1 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-04-08 US disclosed