⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7179849 | 0.81 | — | — | |
| SCHEMBL5401243 | 0.79 | — | — | |
| SCHEMBL6064270 | 0.76 | TSHR (0.31) | — | |
| SCHEMBL5404526 | 0.76 | — | — | |
| SCHEMBL6064104 | 0.75 | — | — | |
| SCHEMBL10541276 | 0.73 | — | — | |
| SCHEMBL3338319 | 0.73 | — | — | |
| SCHEMBL704688 | 0.69 | — | — | |
| SCHEMBL707499 | 0.69 | — | — | |
| SCHEMBL16001337 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118843711-A | Material for gas barrier film, silicon oxide film, and method for producing silicon oxide film | 东曹株式会社 | 2024-10-25 | — | — | CN | disclosed |
| CN-117355632-A | Method for producing planarizing film, material for planarizing film, and planarizing film | 东曹株式会社 | 2024-01-05 | — | — | CN | disclosed |
| US-7291567-B2 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| US-7015292-B2 | Silicon-containing olefin copolymer, crosslinkable rubber composition thereof, and use thereof | MITSUI CHEMICALS, INC. (JP) | 2006-03-21 | — | — | US | disclosed |
| US-20060024980-A1 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2006-02-02 | — | — | US | disclosed |
| EP-1619226-A1 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR Corporation (JP) | 2006-01-25 | — | — | EP | disclosed |
| US-20050038214-A1 | Silicon-containing olefin copolymer, crosslinkable rubber composition thereof, and use thereof | MITSUI CHEMICALS, INC. (JP) | 2005-02-17 | — | — | US | disclosed |