⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5398107 | 0.83 | — | — | |
| SCHEMBL6063236 | 0.78 | TSHR (0.33) | — | |
| SCHEMBL6063258 | 0.77 | — | — | |
| SCHEMBL3341024 | 0.77 | — | — | |
| SCHEMBL5408285 | 0.76 | — | — | |
| SCHEMBL839595 | 0.73 | — | — | |
| SCHEMBL706400 | 0.72 | LMNA (0.32) | — | |
| SCHEMBL704032 | 0.72 | LMNA (0.32) | — | |
| SCHEMBL4999883 | 0.72 | LMNA (0.32) | — | |
| SCHEMBL437305 | 0.70 | TSHR (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117355632-A | Method for producing planarizing film, material for planarizing film, and planarizing film | 东曹株式会社 | 2024-01-05 | — | — | CN | disclosed |
| WO-2022255290-A1 | METHOD FOR MANUFACTURING PLANARIZING FILM, PLANARIZING FILM MATERIAL, AND PLANARIZING FILM | 東ソー株式会社 | 2022-12-08 | — | — | WO | disclosed |
| WO-2022230944-A1 | PLANARIZING FILM MANUFACTURING METHOD, PLANARIZING FILM MATERIAL, AND PLANARIZING FILM | 東ソー株式会社 | 2022-11-03 | — | — | WO | disclosed |
| US-7291567-B2 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| US-7015292-B2 | Silicon-containing olefin copolymer, crosslinkable rubber composition thereof, and use thereof | MITSUI CHEMICALS, INC. (JP) | 2006-03-21 | — | — | US | disclosed |
| US-20060024980-A1 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2006-02-02 | — | — | US | disclosed |
| EP-1619226-A1 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR Corporation (JP) | 2006-01-25 | — | — | EP | disclosed |
| US-20050038214-A1 | Silicon-containing olefin copolymer, crosslinkable rubber composition thereof, and use thereof | MITSUI CHEMICALS, INC. (JP) | 2005-02-17 | — | — | US | disclosed |