SCHEMBL5408352

SCHEMBL5408352

C[Si](C)(C)CC1CCCC1

nearest known ligand 0.36

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.36
NOS1 P29475 4/20 0.32
NOS2 P35228 4/20 0.32
NOS3 P29474 3/20 0.31
ACHE P22303 1/20 0.31
CHRM5 P08912 2/20 0.31
ADRA2C P18825 1/20 0.31
CHRM2 P08172 1/20 0.31
CHRM4 P08173 1/20 0.31
CHRM1 P11229 1/20 0.31
SIGMAR1 Q99720 2/20 0.30
EPHX1 P07099 1/20 0.30
HPGD P15428 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3895538 0.97 CYP1A2 (0.40) CYP1A2NOS1NOS2NOS3ACHE
SCHEMBL13599862 0.81 CYP1A2 (0.42) CYP1A2NOS1NOS2ACHECHRM5
SCHEMBL10356856 0.81 CYP1A2 (0.42) CYP1A2NOS1NOS2ACHECHRM5
SCHEMBL13599864 0.81 CYP1A2 (0.36) CYP1A2ACHECHRM5ADRA2CCHRM2
SCHEMBL13599865 0.79 CYP1A2 (0.40) CYP1A2NOS1NOS2ACHECHRM5
SCHEMBL13599863 0.79 CYP1A2 (0.40) CYP1A2NOS1NOS2ACHECHRM5
SCHEMBL13599858 0.78 CYP1A2 (0.32) CYP1A2
SCHEMBL13599861 0.75 CYP1A2 (0.31) CYP1A2
SCHEMBL18031646 0.75
SCHEMBL25098237 0.75 CYP1A2 (0.37) CYP1A2ACHECHRM5ADRA2CCHRM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7192684-B2 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-03-20 US disclosed
US-20040067436-A1 Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-04-08 US disclosed