SCHEMBL5410185

SCHEMBL5410185

CO[SiH](OC)c1ccc(C(C)(c2ccc([SiH](OC)OC)cc2)c2ccc([SiH](OC)OC)cc2)cc1

nearest known ligand 0.37

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 2/20 0.37
ESR2 Q92731 2/20 0.37
CYP19A1 P11511 2/20 0.32
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5406951 0.83
SCHEMBL14366693 0.82 CA12 (0.32)
SCHEMBL5418205 0.79
SCHEMBL5416479 0.76
SCHEMBL5420321 0.74
SCHEMBL1703269 0.72 ACHE (0.44)
SCHEMBL5143564 0.70 TDP1 (0.46) CYP19A1MEN1KMT2A
SCHEMBL202617 0.69 CA4 (0.41) KMT2A
SCHEMBL5410394 0.68
SCHEMBL5406953 0.68 SLC2A1 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7205338-B2 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-04-17 US disclosed
US-20040180222-A1 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. 2004-09-16 US disclosed