Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5407054 | 0.94 | LMNA (0.40) | LMNA | |
| SCHEMBL5413513 | 0.92 | LMNA (0.43) | LMNA | |
| SCHEMBL5417959 | 0.92 | LMNA (0.43) | LMNA | |
| SCHEMBL329127 | 0.87 | LMNA (0.46) | LMNA | |
| SCHEMBL30892603 | 0.82 | LMNA (0.40) | LMNA | |
| SCHEMBL5412636 | 0.81 | LMNA (0.33) | LMNA | |
| SCHEMBL314475 | 0.81 | LMNA (0.46) | LMNA | |
| SCHEMBL16248364 | 0.80 | LMNA (0.39) | LMNA | |
| SCHEMBL1887028 | 0.80 | LMNA (0.39) | LMNA | |
| SCHEMBL5415533 | 0.79 | LMNA (0.41) | LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240093058-A1 | POLYSILAZANE HARD COATING COMPOSITIONS | MERCK PATENT GMBH (DE) | 2024-03-21 | — | — | US | claimed |
| EP-4274866-A1 | POLYSILAZANE HARD COATING COMPOSITIONS | Merck Patent GmbH (DE) | 2023-11-15 | — | — | EP | claimed |
| WO-2022148757-A1 | POLYSILAZANE HARD COATING COMPOSITIONS | MERCK PATENT GMBH (DE) | 2022-07-14 | — | — | WO | claimed |
| US-20240093058-A1 | POLYSILAZANE HARD COATING COMPOSITIONS | MERCK PATENT GMBH (DE) | 2024-03-21 | — | — | US | disclosed |
| EP-4274866-A1 | POLYSILAZANE HARD COATING COMPOSITIONS | Merck Patent GmbH (DE) | 2023-11-15 | — | — | EP | disclosed |
| US-11739184-B2 | Polysiloxazane compound having alkoxysilyl group, process for producing same, and composition and cured product including same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-29 | — | — | US | disclosed |
| CN-110317457-B | Polysilazane composition, coated substrate, and multilayer structure | 信越化学工业株式会社 | 2022-09-16 | — | — | CN | disclosed |
| WO-2022148757-A1 | POLYSILAZANE HARD COATING COMPOSITIONS | MERCK PATENT GMBH (DE) | 2022-07-14 | — | — | WO | disclosed |
| EP-3798252-B1 | POLYSILOXAZANE COMPOUND HAVING ALKOXYSILYL GROUP, PROCESS FOR PRODUCING SAME, AND COMPOSITION AND CURED PRODUCT INCLUDING SAME | SHINETSU CHEMICAL CO (JP) | 2022-06-29 | — | — | EP | disclosed |
| US-11279848-B2 | Polysilazane composition, coated substrate, and multilayer construction | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-03-22 | — | — | US | disclosed |
| US-20210095079-A1 | POLYSILOXAZANE COMPOUND HAVING ALKOXYSILYL GROUP, PROCESS FOR PRODUCING SAME, AND COMPOSITION AND CURED PRODUCT INCLUDING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-04-01 | — | — | US | disclosed |
| EP-3798252-A1 | POLYSILOXAZANE COMPOUND HAVING ALKOXYSILYL GROUP, PROCESS FOR PRODUCING SAME, AND COMPOSITION AND CURED PRODUCT INCLUDING SAME | Shin-Etsu Chemical Co., Ltd. (JP) | 2021-03-31 | — | — | EP | disclosed |
| US-20210062040-A1 | POLYSILAZANE COMPOSITION, COATED SUBSTRATE, AND MULTILAYER CONSTRUCTION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-03-04 | — | — | US | disclosed |
| EP-3546498-B1 | POLYSILAZANE COMPOSITION, COATED SUBSTRATE, AND MULTILAYER CONSTRUCTION | SHINETSU CHEMICAL CO (JP) | 2020-10-07 | — | — | EP | disclosed |
| EP-3546498-A1 | POLYSILAZANE COMPOSITION, COATED SUBSTRATE, AND MULTILAYER CONSTRUCTION | Shin-Etsu Chemical Co., Ltd. (JP) | 2019-10-02 | — | — | EP | disclosed |
| US-7205338-B2 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-04-17 | — | — | US | disclosed |
| US-20040180222-A1 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. | 2004-09-16 | — | — | US | disclosed |