⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1178980 | 0.86 | — | — | |
| SCHEMBL21152522 | 0.84 | ALDH1A1 (0.62) | — | |
| SCHEMBL21111119 | 0.84 | ALDH1A1 (1.00) | — | |
| SCHEMBL21111146 | 0.79 | ALDH1A1 (0.79) | — | |
| SCHEMBL21111106 | 0.79 | ALDH1A1 (0.79) | — | |
| SCHEMBL29061272 | 0.77 | — | — | |
| SCHEMBL28611936 | 0.75 | — | — | |
| SCHEMBL28609350 | 0.75 | — | — | |
| SCHEMBL20969939 | 0.73 | ALDH1A1 (0.68) | — | |
| SCHEMBL21111121 | 0.73 | ALDH1A1 (0.68) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 103 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11897995-B2 | Allophanate based dispersing agent | BASF SE (DE) | 2024-02-13 | — | — | US | claimed |
| US-20220275146-A1 | ALLOPHANATE BASED DISPERSING AGENT | BASF SE (DE) | 2022-09-01 | — | — | US | claimed |
| EP-3999570-A1 | ALLOPHANATE BASED DISPERSING AGENT | BASF SE (DE) | 2022-05-25 | — | — | EP | claimed |
| CN-114127150-A | Allophanate-based dispersants | 巴斯夫欧洲公司 | 2022-03-01 | — | — | CN | claimed |
| EP-2514853-B1 | Coating-forming liquid composition and coating-forming method therewith | MEC CO LTD (JP) | 2016-02-10 | — | — | EP | claimed |
| EP-1971600-B1 | ISOXAZOLE DERIVATIVES AND USE THEREOF | SK BIOPHARMACEUTICALS CO LTD (KR) | 2013-08-21 | — | — | EP | claimed |
| EP-2259665-B1 | Solution for surface treatment | MEC CO LTD (JP) | 2012-02-08 | — | — | EP | claimed |
| EP-2170876-B1 | PHARMACEUTICAL COMPOSITION FOR PREVENTION AND TREATMENT OF RESTENOSIS COMPRISING ISOXAZOLE DERIVATIVES | SK HOLDINGS CO LTD (KR) | 2011-12-28 | — | — | EP | claimed |
| US-20110028506-A1 | Pharmaceutical Composition For Preventintion And Treatment Of Restenosis Comprising Isoxazole Derivatives | SK BIOPHARMACEUTICALS CO., LTD. (KR) | 2011-02-03 | — | — | US | claimed |
| EP-2259665-A1 | Solution for surface treatment | MEC COMPANY LTD. (JP) | 2010-12-08 | — | — | EP | claimed |
| US-20090131336-A1 | Isoxazole Derivatives and Use Thereof | SK BIOPHARMACEUTICALS CO., LTD. (KR) | 2009-05-21 | — | — | US | claimed |
| US-20080242091-A1 | METAL-POLISHING LIQUID AND POLISHING METHOD | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | claimed |
| US-20070039246-A1 | Method for preparing polishing slurry | LIU ZHENDONG | 2007-02-22 | — | — | US | claimed |
| EP-1548075-A2 | Compositons and methods for barrier removal | Rohm and Haas Electronic Materials CMP Holdings, Inc. (US) | 2005-06-29 | — | — | EP | claimed |
| CN-1630045-A | Compositions and methods for barrier removal | ROHM & HAAS ELECT MAT (US) | 2005-06-22 | — | — | CN | claimed |
| US-20050097825-A1 | Compositions and methods for a barrier removal | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. | 2005-05-12 | — | — | US | claimed |
| US-3948703-A | Method of chemically polishing copper and copper alloy | TOKAI DENKA KOGYO KABUSHIKI KAISHA (JA) | 1976-04-06 | — | — | US | claimed |
| US-11897995-B2 | Allophanate based dispersing agent | BASF SE (DE) | 2024-02-13 | — | — | US | disclosed |
| EP-0890660-A1 | Microetching agent for copper or copper alloys | MEC CO., Ltd. (JP) | 1999-01-13 | — | — | EP | disclosed |
| US-3948703-A | Method of chemically polishing copper and copper alloy | TOKAI DENKA KOGYO KABUSHIKI KAISHA (JA) | 1976-04-06 | — | — | US | disclosed |