Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL703016 | 0.70 | THRB (0.40) | THRBLMNA | |
| SCHEMBL7634474 | 0.70 | THRB (0.44) | THRBLMNA | |
| SCHEMBL27975602 | 0.68 | THRB (0.34) | THRB | |
| SCHEMBL18928 | 0.67 | THRB (1.00) | THRBLMNA | |
| SCHEMBL14763948 | 0.67 | THRB (1.00) | THRBLMNA | |
| SCHEMBL662137 | 0.67 | THRB (0.50) | THRBLMNA | |
| SCHEMBL8087707 | 0.67 | — | — | |
| Alcohol SCHEMBL3582748 | 0.66 | THRB (0.79) | THRBLMNA | |
| SCHEMBL783625 | 0.65 | THRB (0.48) | THRBLMNA | |
| Hydrochloric Acid SCHEMBL31648719 | 0.65 | THRB (0.92) | THRBLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7172657-B2 | Cleaning method of treatment equipment and treatment equipment | TOKYO ELECTRON LIMITED (JP) | 2007-02-06 | — | — | US | claimed |
| EP-0854507-B1 | Precursor with (alkoxy) (alkyl) vinylsilane ligand to deposit copper and method for the same | SHARP KK (JP) | 2006-06-07 | — | — | EP | claimed |
| EP-0852229-B1 | Precursor with (methoxy) (methyl) silylolefin ligands to deposit copper and method for the same | SHARP KK (JP) | 2003-03-05 | — | — | EP | claimed |
| US-6090960-A | CUPROUS (HEXAFLUOROACETYLACETONATE) COMPLEX WITH A METHOXYSILYLOLEFIN | SHARP LABORATORIES OF AMERICA, INC. (US) | 2000-07-18 | — | — | US | claimed |
| EP-0854507-A2 | Precursor with (alkyloxy) (alkyl) silylolefin ligand to deposit copper and method for the same | SHARP KABUSHIKI KAISHA (JP) | 1998-07-22 | — | — | EP | claimed |
| EP-0852229-A2 | Precursor with (methoxy) (methyl) silylolefin ligands to deposit copper and method for the same | SHARP KABUSHIKI KAISHA (JP) | 1998-07-08 | — | — | EP | claimed |
| US-5767301-A | COPPER HEXAFLUOROACETYLACETONATE WITH ETHOXYVINYLSILANE LIGAND; CHEMICAL VAPOR DEPOSITION | SHARP MICROELECTRONICS TECHNOLOGY, INC. (US) | 1998-06-16 | — | — | US | claimed |
| US-20130099423-A1 | PHOTOCURABLE COMPOSITION FOR IMPRINT AND METHOD FOR FORMATION OF PATTERN USING THE COMPOSITION | TOKUYAMA CORPORATION (JP) | 2013-04-25 | — | — | US | disclosed |
| US-20070074739-A1 | Cleaning method of treatment equipment and treatment equipment | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | disclosed |
| US-7172657-B2 | Cleaning method of treatment equipment and treatment equipment | TOKYO ELECTRON LIMITED (JP) | 2007-02-06 | — | — | US | disclosed |
| EP-0854507-B1 | Precursor with (alkoxy) (alkyl) vinylsilane ligand to deposit copper and method for the same | SHARP KK (JP) | 2006-06-07 | — | — | EP | disclosed |
| EP-0852229-B1 | Precursor with (methoxy) (methyl) silylolefin ligands to deposit copper and method for the same | SHARP KK (JP) | 2003-03-05 | — | — | EP | disclosed |
| EP-0743347-B1 | Water-based fluorine-containing paint | CENTRAL GLASS CO LTD (JP) | 2001-12-05 | — | — | EP | disclosed |
| US-6090960-A | CUPROUS (HEXAFLUOROACETYLACETONATE) COMPLEX WITH A METHOXYSILYLOLEFIN | SHARP LABORATORIES OF AMERICA, INC. (US) | 2000-07-18 | — | — | US | disclosed |
| EP-0987346-A1 | Copper deposition method using a precursor with (alkyloxy) (alkyl)silylolefin ligands | Sharp Kabushiki Kaisha (JP) | 2000-03-22 | — | — | EP | disclosed |
| US-5856394-A | TETRAPOLYMERS OF FLUOROOLEFIN, VINYL ETHER OR ESTER, OMEGA-UNSATURATED ALKENOIC ACID, ALLYL ACETOACETATE OR ALKYLENE OXIDE DERIVATIVE, HYDRAZINE HARDENER | CENTRAL GLASS COMPANY, LIMITED (JP) | 1999-01-05 | — | — | US | disclosed |
| EP-0854507-A2 | Precursor with (alkyloxy) (alkyl) silylolefin ligand to deposit copper and method for the same | SHARP KABUSHIKI KAISHA (JP) | 1998-07-22 | — | — | EP | disclosed |
| EP-0852229-A2 | Precursor with (methoxy) (methyl) silylolefin ligands to deposit copper and method for the same | SHARP KABUSHIKI KAISHA (JP) | 1998-07-08 | — | — | EP | disclosed |
| US-5767301-A | COPPER HEXAFLUOROACETYLACETONATE WITH ETHOXYVINYLSILANE LIGAND; CHEMICAL VAPOR DEPOSITION | SHARP MICROELECTRONICS TECHNOLOGY, INC. (US) | 1998-06-16 | — | — | US | disclosed |
| EP-0743347-A2 | Water-based fluorine-containing paint | CENTRAL GLASS COMPANY, LIMITED (JP) | 1996-11-20 | — | — | EP | disclosed |