⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4173215 | 0.87 | — | — | |
| SCHEMBL23303 | 0.71 | — | — | |
| SCHEMBL23853342 | 0.70 | PTGS1 (0.34) | — | |
| SCHEMBL5685546 | 0.69 | — | — | |
| SCHEMBL25079496 | 0.69 | — | — | |
| SCHEMBL15448059 | 0.68 | ALDH1A1 (0.35) | — | |
| SCHEMBL7769047 | 0.68 | ALDH1A1 (0.35) | — | |
| SCHEMBL7769045 | 0.68 | ALDH1A1 (0.35) | — | |
| SCHEMBL15437113 | 0.67 | ALDH1A1 (0.39) | — | |
| Hydrogen Sulfide SCHEMBL2524388 | 0.67 | ALDH1A1 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7172657-B2 | Cleaning method of treatment equipment and treatment equipment | TOKYO ELECTRON LIMITED (JP) | 2007-02-06 | — | — | US | claimed |
| EP-0854507-B1 | Precursor with (alkoxy) (alkyl) vinylsilane ligand to deposit copper and method for the same | SHARP KK (JP) | 2006-06-07 | — | — | EP | claimed |
| EP-0852229-B1 | Precursor with (methoxy) (methyl) silylolefin ligands to deposit copper and method for the same | SHARP KK (JP) | 2003-03-05 | — | — | EP | claimed |
| US-6090960-A | CUPROUS (HEXAFLUOROACETYLACETONATE) COMPLEX WITH A METHOXYSILYLOLEFIN | SHARP LABORATORIES OF AMERICA, INC. (US) | 2000-07-18 | — | — | US | claimed |
| EP-0854507-A2 | Precursor with (alkyloxy) (alkyl) silylolefin ligand to deposit copper and method for the same | SHARP KABUSHIKI KAISHA (JP) | 1998-07-22 | — | — | EP | claimed |
| EP-0852229-A2 | Precursor with (methoxy) (methyl) silylolefin ligands to deposit copper and method for the same | SHARP KABUSHIKI KAISHA (JP) | 1998-07-08 | — | — | EP | claimed |
| US-5767301-A | COPPER HEXAFLUOROACETYLACETONATE WITH ETHOXYVINYLSILANE LIGAND; CHEMICAL VAPOR DEPOSITION | SHARP MICROELECTRONICS TECHNOLOGY, INC. (US) | 1998-06-16 | — | — | US | claimed |
| US-20070074739-A1 | Cleaning method of treatment equipment and treatment equipment | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | disclosed |
| US-7172657-B2 | Cleaning method of treatment equipment and treatment equipment | TOKYO ELECTRON LIMITED (JP) | 2007-02-06 | — | — | US | disclosed |
| EP-0854507-B1 | Precursor with (alkoxy) (alkyl) vinylsilane ligand to deposit copper and method for the same | SHARP KK (JP) | 2006-06-07 | — | — | EP | disclosed |
| EP-0852229-B1 | Precursor with (methoxy) (methyl) silylolefin ligands to deposit copper and method for the same | SHARP KK (JP) | 2003-03-05 | — | — | EP | disclosed |
| US-20010020478-A1 | Cleaning method of tratment equipment and treatment equipment | TOKYO ELECTRON LIMITED (JP) | 2001-09-13 | — | — | US | disclosed |
| US-6090960-A | CUPROUS (HEXAFLUOROACETYLACETONATE) COMPLEX WITH A METHOXYSILYLOLEFIN | SHARP LABORATORIES OF AMERICA, INC. (US) | 2000-07-18 | — | — | US | disclosed |
| EP-0987346-A1 | Copper deposition method using a precursor with (alkyloxy) (alkyl)silylolefin ligands | Sharp Kabushiki Kaisha (JP) | 2000-03-22 | — | — | EP | disclosed |
| EP-0854507-A2 | Precursor with (alkyloxy) (alkyl) silylolefin ligand to deposit copper and method for the same | SHARP KABUSHIKI KAISHA (JP) | 1998-07-22 | — | — | EP | disclosed |
| EP-0852229-A2 | Precursor with (methoxy) (methyl) silylolefin ligands to deposit copper and method for the same | SHARP KABUSHIKI KAISHA (JP) | 1998-07-08 | — | — | EP | disclosed |
| US-5767301-A | COPPER HEXAFLUOROACETYLACETONATE WITH ETHOXYVINYLSILANE LIGAND; CHEMICAL VAPOR DEPOSITION | SHARP MICROELECTRONICS TECHNOLOGY, INC. (US) | 1998-06-16 | — | — | US | disclosed |