SCHEMBL5434014

SCHEMBL5434014

CC(C)COC(=O)CC[C@@H](C)[C@H]1CC[C@H]2[C@@H]3CC[C@@H]4C[C@H](O)CC[C@]4(C)[C@H]3CC[C@]12C

nearest known ligand 0.80

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ GPBAR1 Q8TDU6 5/20 0.80
▸ VDR P11473 4/20 0.80
▸ HIF1A Q16665 3/20 0.80
▸ CYP2C9 P11712 2/20 0.80
▸ EPHA2 P29317 4/20 0.74
▸ CASP7 P55210 3/20 0.74
▸ TP53 P04637 2/20 0.74
▸ MAPK1 P28482 2/20 0.74
▸ HSD17B10 Q99714 2/20 0.74
▸ BLM P54132 2/20 0.74
▸ TDP1 Q9NUW8 2/20 0.74
▸ USP2 O75604 2/20 0.74
▸ CYP3A4 P08684 2/20 0.74
▸ MDM4 O15151 1/20 0.74
▸ MAPT P10636 1/20 0.74
▸ HSPD1 P10809 1/20 0.74
▸ TSHR P16473 1/20 0.74
▸ PTPN2 P17706 1/20 0.74
▸ PTPN1 P18031 1/20 0.74
▸ BRCA1 P38398 1/20 0.74

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5434017 1.00 GPBAR1 (0.80) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL5436348 0.96 GPBAR1 (0.75) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL5436351 0.96 GPBAR1 (0.75) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL25470140 0.91 GPBAR1 (0.79) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL19565489 0.91 GPBAR1 (0.81) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL5442890 0.91 GPBAR1 (0.81) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL13648593 0.91 GPBAR1 (0.81) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL5442887 0.91 GPBAR1 (0.81) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL29386162 0.90 GPBAR1 (0.86) GPBAR1VDRHIF1ACYP2C9EPHA2
SCHEMBL5434267 0.89 GPBAR1 (0.79) GPBAR1VDRHIF1ACYP2C9EPHA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070254247-A1 Radiation-sensitive resin composition YAMAMOTO MASAFUMI 2007-11-01 — — US disclosed
US-7005230-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-02-28 — — US disclosed
US-6800419-B2 FOR USE AS CHEMICALLY-AMPLIFIED RESIST FOR MICROFABRICATION UTILIZING DEEP ULTRAVIOLET RAYS AND EXHIBITS EXCELLENT FILM THICKNESS UNIFORMITY AND STORAGE STABILITY JSR CORPORATION (JP) 2004-10-05 — — US disclosed
US-20040146802-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2004-07-29 — — US disclosed
US-20030203307-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2003-10-30 — — US disclosed
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