SCHEMBL5436906

SCHEMBL5436906

CCCOC(=O)CC[C@@H](C)[C@H]1CC[C@H]2[C@@H]3CC[C@@H]4C[C@H](O)CC[C@]4(C)[C@H]3C[C@H](O)[C@]12C

nearest known ligand 0.80

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 2/20 0.80
▸ MEN1 O00255 2/20 0.80
▸ KMT2A Q03164 2/20 0.80
▸ USP2 O75604 2/20 0.80
▸ MAPK1 P28482 2/20 0.80
▸ LMNA P02545 1/20 0.80
▸ GPBAR1 Q8TDU6 9/20 0.75
▸ SLC10A2 Q12908 2/20 0.75
▸ TBXA2R P21731 1/20 0.75
▸ PDE3A Q14432 1/20 0.75
▸ NR1H4 Q96RI1 1/20 0.75
▸ CA1 P00915 4/20 0.70
▸ CA2 P00918 4/20 0.70
▸ ABCC4 O15439 1/20 0.63
▸ CYP2C9 P11712 1/20 0.62
▸ HIF1A Q16665 1/20 0.62
▸ VDR P11473 1/20 0.62
▸ CYP3A4 P08684 2/20 0.60
▸ SLCO1B3 Q9NPD5 1/20 0.60
▸ SLCO1B1 Q9Y6L6 1/20 0.60

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5437339 0.97 MAPT (0.75) MAPTMEN1KMT2AUSP2MAPK1
SCHEMBL5437748 0.95 MAPT (0.77) MAPTMEN1KMT2AUSP2MAPK1
SCHEMBL26424135 0.95 MAPT (0.77) MAPTMEN1KMT2AUSP2MAPK1
SCHEMBL5531597 0.93 MAPT (0.80) MAPTMEN1KMT2AUSP2MAPK1
SCHEMBL4971166 0.93 MAPT (0.83) MAPTMEN1KMT2AUSP2MAPK1
SCHEMBL22699678 0.93 MAPT (0.83) MAPTMEN1KMT2AUSP2MAPK1
SCHEMBL137537 0.92 MAPT (0.76) MAPTMEN1KMT2AUSP2MAPK1
SCHEMBL5437809 0.92 MAPT (0.73) MAPTMEN1KMT2AUSP2MAPK1
SCHEMBL31452978 0.91 MAPT (0.75) MAPTMEN1KMT2AUSP2MAPK1
SCHEMBL31452985 0.91 MAPT (0.77) MAPTMEN1KMT2AUSP2MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070254247-A1 Radiation-sensitive resin composition YAMAMOTO MASAFUMI 2007-11-01 — — US disclosed
US-7005230-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-02-28 — — US disclosed
US-6800419-B2 FOR USE AS CHEMICALLY-AMPLIFIED RESIST FOR MICROFABRICATION UTILIZING DEEP ULTRAVIOLET RAYS AND EXHIBITS EXCELLENT FILM THICKNESS UNIFORMITY AND STORAGE STABILITY JSR CORPORATION (JP) 2004-10-05 — — US disclosed
US-20040146802-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2004-07-29 — — US disclosed
US-20030203307-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2003-10-30 — — US disclosed
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