Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.76 |
| ▸ | MEN1 | O00255 | 2/20 | 0.76 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.76 |
| ▸ | USP2 | O75604 | 2/20 | 0.76 |
| ▸ | LMNA | P02545 | 1/20 | 0.76 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.76 |
| ▸ | GPBAR1 | Q8TDU6 | 9/20 | 0.71 |
| ▸ | SLC10A2 | Q12908 | 2/20 | 0.71 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.71 |
| ▸ | PDE3A | Q14432 | 1/20 | 0.71 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.71 |
| ▸ | CA1 | P00915 | 5/20 | 0.70 |
| ▸ | CA2 | P00918 | 5/20 | 0.70 |
| ▸ | ABCC4 | O15439 | 1/20 | 0.61 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.60 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.60 |
| ▸ | VDR | P11473 | 1/20 | 0.60 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.58 |
| ▸ | SLCO1B3 | Q9NPD5 | 1/20 | 0.58 |
| ▸ | SLCO1B1 | Q9Y6L6 | 1/20 | 0.58 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5436906 | 0.92 | MAPT (0.80) | MAPTMEN1KMT2AUSP2LMNA | |
| SCHEMBL4971166 | 0.92 | MAPT (0.83) | MAPTMEN1KMT2AUSP2LMNA | |
| SCHEMBL22699678 | 0.92 | MAPT (0.83) | MAPTMEN1KMT2AUSP2LMNA | |
| SCHEMBL26424135 | 0.91 | MAPT (0.77) | MAPTMEN1KMT2AUSP2LMNA | |
| SCHEMBL5437748 | 0.91 | MAPT (0.77) | MAPTMEN1KMT2AUSP2LMNA | |
| SCHEMBL5531597 | 0.91 | MAPT (0.80) | MAPTMEN1KMT2AUSP2LMNA | |
| SCHEMBL139260 | 0.90 | GPBAR1 (0.75) | MAPTUSP2LMNAMAPK1GPBAR1 | |
| SCHEMBL139261 | 0.90 | GPBAR1 (0.75) | MAPTUSP2LMNAMAPK1GPBAR1 | |
| SCHEMBL31452978 | 0.89 | MAPT (0.75) | MAPTMEN1KMT2AUSP2LMNA | |
| SCHEMBL5437339 | 0.89 | MAPT (0.75) | MAPTMEN1KMT2AUSP2LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 294 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11966160-B2 | Radiation-sensitive resin composition and method for forming pattern | JSR CORPORATION (JP) | 2024-04-23 | — | — | US | disclosed |
| US-20230393469-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2023-12-07 | — | — | US | disclosed |
| US-20230341772-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2023-10-26 | — | — | US | disclosed |
| US-20230280652-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING MONOMERIC COMPOUND | JSR CORPORATION (JP) | 2023-09-07 | — | — | US | disclosed |
| US-11747725-B2 | Radiation-sensitive resin composition and method for forming resist pattern | JSR CORPORATION (JP) | 2023-09-05 | — | — | US | disclosed |
| US-11709428-B2 | Radiation-sensitive resin composition, method for forming pattern, and method for producing monomeric compound | JSR CORPORATION (JP) | 2023-07-25 | — | — | US | disclosed |
| US-11681222-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2023-06-20 | — | — | US | disclosed |
| US-20230106095-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | JSR CORPORATION (JP) | 2023-04-06 | — | — | US | disclosed |
| US-20230103682-A1 | METHOD FOR FORMING RESIST PATTERN AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2023-04-06 | — | — | US | disclosed |
| US-20230104260-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2023-04-06 | — | — | US | disclosed |
| US-6403280-B1 | TERPOLYMER COMPRISING MALEIC ANHYDRIDE, NORBORNENE ESTER DERIVATIVE, AND ALICYCLIC (METH)ACRYLATE MONOMERS; DURABILITY TO DRY ETCHING; TRANSPARENCY, STORAGE STABILITY | JSR CORPORATION (JP) | 2002-06-11 | — | — | US | disclosed |
| US-20020009668-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| US-20020009667-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1162506-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-12 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
| US-6180316-B1 | SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-01-30 | — | — | US | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230341772-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | RER1, XRCC5, F12 | MAPT 3826/4885MEN1 1944/4885KMT2A 1428/4885 |
| US-20230393469-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER, AND COMPOUND | RER1, RAD51, RFT1 | MAPT 3448/4885MEN1 1250/4885KMT2A 1233/4885 |
| US-11747725-B2 | Radiation-sensitive resin composition and method for forming resist pattern | RER1, AFF1, RAD51 | MAPT 3933/4885MEN1 2713/4885KMT2A 2230/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.