SCHEMBL5440799

SCHEMBL5440799

CC(C)(OC(=O)CCN)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 5/20 0.40
CA12 O43570 1/20 0.35
CA2 P00918 1/20 0.35
CA7 P43166 1/20 0.35
CA9 Q16790 1/20 0.35
CA14 Q9ULX7 1/20 0.35
MEN1 O00255 1/20 0.34
MAPK1 P28482 1/20 0.34
KMT2A Q03164 1/20 0.34
ALOX15 P16050 1/20 0.33
GRIN2D O15399 1/20 0.32
GRIN3B O60391 1/20 0.32
GRIN1 Q05586 1/20 0.32
GRIN2A Q12879 1/20 0.32
GRIN2B Q13224 1/20 0.32
GRIN2C Q14957 1/20 0.32
GRIN3A Q8TCU5 1/20 0.32
CYP17A1 P05093 2/20 0.32
CYP19A1 P11511 2/20 0.32
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25968927 0.90 EPHX2 (0.43) EPHX2CA12CA2CA7CA9
SCHEMBL12197283 0.85 EPHX2 (0.41) EPHX2CA12CA2CA7CA9
SCHEMBL13527834 0.84 EPHX2 (0.40) EPHX2CA12CA2CA7CA9
SCHEMBL12058487 0.81 EPHX2 (0.37) EPHX2CA12CA2CA7CA9
SCHEMBL97804 0.81 EPHX2 (0.37) EPHX2CA12CA2CA7CA9
SCHEMBL13588095 0.81 EPHX2 (0.39) EPHX2CA12CA2CA7CA9
SCHEMBL4547708 0.80 EPHX2 (0.39) EPHX2CA12CA2CA7CA9
SCHEMBL4547707 0.80 EPHX2 (0.36) EPHX2CA12CA2CA7CA9
SCHEMBL13527830 0.80 EPHX2 (0.36) EPHX2CA12CA2CA7CA9
SCHEMBL13952728 0.79 EPHX2 (0.37) EPHX2CA12CA2CA7CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8426101-B2 Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition FUJIFILM CORPORATION (JP) 2013-04-23 US disclosed
US-20070141512-A1 Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition FUJIFILM CORPORATION (JP) 2007-06-21 US disclosed