Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 2/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.36 |
| ▸ | MEN1 | O00255 | 3/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA7 | P43166 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 1/20 | 0.35 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.34 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25968927 | 0.87 | EPHX2 (0.43) | EPHX2KMT2AMEN1MAPK1ALDH1A1 | |
| SCHEMBL12197283 | 0.86 | EPHX2 (0.41) | EPHX2KMT2AMEN1MAPK1ALDH1A1 | |
| SCHEMBL12058487 | 0.86 | EPHX2 (0.37) | EPHX2KMT2AMEN1MAPK1ALDH1A1 | |
| SCHEMBL13527830 | 0.84 | EPHX2 (0.36) | EPHX2KMT2AMEN1MAPK1ALDH1A1 | |
| SCHEMBL4547708 | 0.84 | EPHX2 (0.39) | EPHX2KMT2AMEN1MAPK1ALDH1A1 | |
| SCHEMBL4547707 | 0.84 | EPHX2 (0.36) | EPHX2KMT2AMEN1MAPK1ALDH1A1 | |
| SCHEMBL14839167 | 0.83 | EPHX2 (0.35) | EPHX2KMT2AMEN1MAPK1ALDH1A1 | |
| SCHEMBL2168089 | 0.83 | EPHX2 (0.38) | EPHX2KMT2AMEN1MAPK1ALDH1A1 | |
| SCHEMBL13588099 | 0.81 | EPHX2 (0.35) | EPHX2KMT2AMEN1MAPK1ALDH1A1 | |
| SCHEMBL13609148 | 0.81 | EPHX2 (0.38) | EPHX2KMT2AMEN1MAPK1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11914294-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027909-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11860540-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-02 | — | — | US | disclosed |
| US-20230350296-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-02 | — | — | US | disclosed |
| US-20230314944-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230288804-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-14 | — | — | US | disclosed |
| US-11709427-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-25 | — | — | US | disclosed |
| US-20230161252-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161255-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20100227273-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-09-09 | — | — | US | disclosed |
| US-20100227274-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-09-09 | — | — | US | disclosed |
| US-20100159392-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7615330-B2 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2009-11-10 | — | — | US | disclosed |
| US-20090274977-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2009-11-05 | — | — | US | disclosed |
| US-20090274977-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2009-11-05 | — | — | US | disclosed |
| EP-2100870-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | JSR Corporation (JP) | 2009-09-16 | — | — | EP | disclosed |
| EP-2009498-A1 | Pattern forming method | FUJIFILM Corporation (JP) | 2008-12-31 | — | — | EP | disclosed |
| EP-1491560-B1 | PROCESS FOR THE PRODUCTION OF HIGH-MOLECULAR COMPOUNDS FOR PHOTORESIST | DAICEL CHEM (JP) | 2007-11-21 | — | — | EP | disclosed |
| US-20070224540-A1 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-09-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11709427-B2 | Positive resist composition and pattern forming process | EWSR1, PARG, VIM | EPHX2 4575/4885KMT2A 1022/4885MEN1 2592/4885 |
| US-20090274977-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | RAD51, SLC11A2, XRCC6 | EPHX2 3619/4885KMT2A 1465/4885MEN1 135/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.