4-Vinylphenol

4-Vinylphenol

SCHEMBL5445858

C=C(C)C(=O)OC12CC3CC(CC(C3)C1)C2.C=Cc1ccc(C(C)(C)C)cc1.C=Cc1ccc(O)cc1

nearest known ligand 0.37

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 4/20 0.37
CYP17A1 P05093 3/20 0.37
ESRRG P62508 2/20 0.36
LMNA P02545 1/20 0.35
TYR P14679 1/20 0.35
GAA P10253 1/20 0.34
MAPT P10636 1/20 0.34
XBP1 P17861 1/20 0.34
KMT2A Q03164 4/20 0.34
MEN1 O00255 3/20 0.34
CNR2 P34972 1/20 0.34
NPSR1 Q6W5P4 2/20 0.32
CYP1A2 P05177 1/20 0.32
HSP90AA1 P07900 2/20 0.32
GRIN2B Q13224 1/20 0.32
CKS1B P61024 1/20 0.32
SKP1 P63208 1/20 0.32
SKP2 Q13309 1/20 0.32
MIF P14174 1/20 0.31
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
4-Vinylphenol SCHEMBL29145053 0.92 MAPT (0.40) CYP19A1CYP17A1GAAMAPTXBP1
SCHEMBL6315692 0.90 CYP1A2 (0.36) CYP19A1CYP17A1ESRRGLMNATYR
4-Vinylphenol SCHEMBL14719716 0.80 GAA (0.37) CYP19A1CYP17A1GAAMAPTXBP1
SCHEMBL5443982 0.79 MAPT (0.39) GAAMAPTXBP1KMT2AMEN1
SCHEMBL5446080 0.78 CYP1A2 (0.37) CYP19A1CYP17A1ESRRGLMNATYR
SCHEMBL5442500 0.78 GABBR2 (0.36) CYP19A1CYP17A1GAAMAPTXBP1
4-Vinylphenol SCHEMBL28477804 0.78 MAPT (0.36) GAAMAPTXBP1KMT2AMEN1
4-Vinylphenol SCHEMBL14719729 0.78 GAA (0.36) CYP19A1CYP17A1GAAMAPTXBP1
4-Vinylphenol SCHEMBL6333219 0.76 CYP17A1 (0.37) CYP19A1CYP17A1GAAMAPTXBP1
SCHEMBL5442457 0.75 KMT2A (0.38) CYP19A1CYP17A1LMNAGAAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7312014-B2 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2007-12-25 US disclosed
US-20030017425-A1 Pattern formation method MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2003-01-23 US disclosed