SCHEMBL5448339

SCHEMBL5448339

CCCCN(CCCC)CCCNC(=S)Nc1ccccc1

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.67
GAA P10253 5/20 0.60
MAPT P10636 4/20 0.60
ALDH1A1 P00352 3/20 0.60
RAB9A P51151 3/20 0.60
HTT P42858 3/20 0.60
NPC1 O15118 2/20 0.60
NPSR1 Q6W5P4 2/20 0.60
ALOX12 P18054 3/20 0.60
LMNA P02545 5/20 0.58
SMN1; SMN2 Q16637 4/20 0.56
MAOA P21397 1/20 0.53
MAOB P27338 1/20 0.53
MEN1 O00255 1/20 0.52
HPGD P15428 1/20 0.52
L3MBTL1 Q9Y468 1/20 0.51
CRHBP P24387 1/20 0.51
CRHR2 Q13324 1/20 0.51
ICMT O60725 1/20 0.51
ALB P02768 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3958934 0.88 KMT2A (0.80) KMT2AGAAMAPTALDH1A1RAB9A
SCHEMBL11438307 0.86 KMT2A (0.77) KMT2AGAAMAPTALDH1A1RAB9A
SCHEMBL10941979 0.85 KMT2A (0.71) KMT2AGAAMAPTALDH1A1RAB9A
SCHEMBL10667599 0.84 KMT2A (0.75) KMT2AGAAMAPTALDH1A1RAB9A
SCHEMBL5446742 0.84 KMT2A (0.75) KMT2AGAAMAPTALDH1A1RAB9A
SCHEMBL5445779 0.84 KMT2A (0.75) KMT2AGAAMAPTALDH1A1RAB9A
SCHEMBL11068116 0.84 KMT2A (0.75) KMT2AGAAMAPTALDH1A1RAB9A
SCHEMBL5447975 0.84 KMT2A (0.75) KMT2AGAAMAPTALDH1A1RAB9A
SCHEMBL5445981 0.84 KMT2A (0.75) KMT2AGAAMAPTALDH1A1RAB9A
SCHEMBL28223385 0.84 KMT2A (0.75) KMT2AGAAMAPTALDH1A1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070040151-A1 Two-component initiator system (amine-free) with very good storage stability and particular suitability for acid systems HERAEUS KULZER GMBH (DE) 2007-02-22 US disclosed
US-5308735-A Aromatic-aldehyde resins, improved solubility NIPPON PAINT CO., LTD. (JP) 1994-05-03 US disclosed
EP-0540016-A1 Photosensitive resin and resin composition for lithographic printing Nippon Paint Co., Ltd. (JP) 1993-05-05 EP disclosed