⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1614975 | 1.00 | — | — | |
| SCHEMBL5469813 | 1.00 | — | — | |
| SCHEMBL8053727 | 0.87 | — | — | |
| SCHEMBL5615419 | 0.87 | — | — | |
| SCHEMBL4918399 | 0.87 | — | — | |
| SCHEMBL29382254 | 0.82 | — | — | |
| SCHEMBL29833055 | 0.82 | — | — | |
| SCHEMBL11654272 | 0.82 | — | — | |
| SCHEMBL1902881 | 0.82 | — | — | |
| SCHEMBL34398 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20070134563-A1 | Photomask and method of manufacturing semiconductor device | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-06-14 | — | — | US | claimed |
| US-7297983-B2 | Method for fabricating an integrated circuit on a semiconductor substrate | INFINEON TECHNOLOGIES AG (DE) | 2007-11-20 | — | — | US | disclosed |
| US-20070155139-A1 | Method for fabricating an integrated circuit on a semiconductor substrate | INFINEON TECHNOLOGIES AG (DE) | 2007-07-05 | — | — | US | disclosed |
| US-20070134563-A1 | Photomask and method of manufacturing semiconductor device | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-06-14 | — | — | US | disclosed |