SCHEMBL5469813

SCHEMBL5469813

[O-2].[O-2].[O-2].[O-2].[O-2].[SiH4].[SiH4].[Ta+5].[Ta+5]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1614975 1.00
SCHEMBL5449685 1.00
SCHEMBL8053727 0.87
SCHEMBL5615419 0.87
SCHEMBL4918399 0.87
SCHEMBL29382254 0.82
SCHEMBL29833055 0.82
SCHEMBL11654272 0.82
SCHEMBL1902881 0.82
SCHEMBL34398 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-209311839-U A kind of electrochomeric glass 苏州天瑞纳米科技有限公司 2019-08-27 CN claimed
WO-2023279524-A1 SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE 长鑫存储技术有限公司 2023-01-12 WO disclosed
US-20230007832-A1 SEMICONDUCTOR STRUCTURE AND METHOD FOR FABRICATING SEMICONDUCTOR STRUCTURE CHANGXIN MEMORY TECHNOLOGIES, INC. (CN) 2023-01-12 US disclosed
CN-209311839-U A kind of electrochomeric glass 苏州天瑞纳米科技有限公司 2019-08-27 CN disclosed
CN-109314135-A Grid pile stack for GaN E mode transistor performance designs 英特尔公司 2019-02-05 CN disclosed
CN-107851659-A Transistor with air gap separation body 英特尔公司 2018-03-27 CN disclosed
CN-107004706-A Integrated circuit die with reduced-defect group III-nitride structures and methods associated therewith 英特尔公司 2017-08-01 CN disclosed
US-8766233-B2 Semiconductor device with variable resistance element and method for manufacturing the same NEC CORPORATION (JP) 2014-07-01 US disclosed
US-20120267598-A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME NEC CORPORATION (JP) 2012-10-25 US disclosed
US-20070272974-A1 TWIN-GATE NON-VOLATILE MEMORY CELL AND METHOD OF OPERATING THE SAME EMEMORY TECHNOLOGY INC. (TW) 2007-11-29 US disclosed