Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.51 |
| ▸ | PLA2G2C | Q5R387 | 7/20 | 0.43 |
| ▸ | CES2 | O00748 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | USP2 | O75604 | 1/20 | 0.41 |
| ▸ | LPAR1 | Q92633 | 2/20 | 0.40 |
| ▸ | LPAR3 | Q9UBY5 | 2/20 | 0.40 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.40 |
| ▸ | TLR2 | O60603 | 2/20 | 0.39 |
| ▸ | LPAR5 | Q9H1C0 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5449767 | 1.00 | TSHR (0.51) | TSHRPLA2G2CCES2TDP1USP2 | |
| SCHEMBL11760421 | 1.00 | TSHR (0.51) | TSHRPLA2G2CCES2TDP1USP2 | |
| SCHEMBL5450809 | 1.00 | TSHR (0.51) | TSHRPLA2G2CCES2TDP1USP2 | |
| SCHEMBL4819070 | 0.99 | TSHR (0.49) | TSHRPLA2G2CCES2TDP1USP2 | |
| SCHEMBL27660620 | 0.96 | TSHR (0.56) | TSHRPLA2G2CCES2USP2LPAR1 | |
| SCHEMBL15302991 | 0.96 | TSHR (0.56) | TSHRPLA2G2CCES2USP2LPAR1 | |
| SCHEMBL503413 | 0.94 | TDP1 (0.44) | TSHRPLA2G2CCES2TDP1USP2 | |
| SCHEMBL11111869 | 0.94 | TDP1 (0.44) | TSHRPLA2G2CCES2TDP1USP2 | |
| SCHEMBL887703 | 0.94 | TDP1 (0.44) | TSHRPLA2G2CCES2TDP1USP2 | |
| SCHEMBL7191777 | 0.90 | TSHR (0.46) | TSHRPLA2G2CCES2TDP1USP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9417522-B2 | Photosensitive resin composition and method for producing resist pattern | JSR CORPORATION (JP) | 2016-08-16 | — | — | US | disclosed |
| US-20150185604-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | JSR CORPORATION (JP) | 2015-07-02 | — | — | US | disclosed |
| US-20070231747-A1 | Radiation-sensitive negative resin composition | JSR CORPORATION (JP) | 2007-10-04 | — | — | US | disclosed |