Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 3/20 | 0.42 |
| ▸ | THRB | P10828 | 1/20 | 0.37 |
| ▸ | PLA2G2C | Q5R387 | 6/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | CES2 | O00748 | 1/20 | 0.34 |
| ▸ | USP2 | O75604 | 2/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | LPAR1 | Q92633 | 2/20 | 0.33 |
| ▸ | LPAR3 | Q9UBY5 | 2/20 | 0.33 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.33 |
| ▸ | TLR2 | O60603 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11111869 | 1.00 | TDP1 (0.44) | TDP1TSHRTHRBPLA2G2CALDH1A1 | |
| SCHEMBL887703 | 1.00 | TDP1 (0.44) | TDP1TSHRTHRBPLA2G2CALDH1A1 | |
| SCHEMBL4819070 | 0.95 | TSHR (0.49) | TDP1TSHRPLA2G2CCES2USP2 | |
| SCHEMBL7191777 | 0.95 | TSHR (0.46) | TDP1TSHRTHRBPLA2G2CALDH1A1 | |
| SCHEMBL5451861 | 0.94 | TSHR (0.51) | TDP1TSHRPLA2G2CCES2USP2 | |
| SCHEMBL11760421 | 0.94 | TSHR (0.51) | TDP1TSHRPLA2G2CCES2USP2 | |
| SCHEMBL5450809 | 0.94 | TSHR (0.51) | TDP1TSHRPLA2G2CCES2USP2 | |
| SCHEMBL5449767 | 0.94 | TSHR (0.51) | TDP1TSHRPLA2G2CCES2USP2 | |
| SCHEMBL4815158 | 0.91 | TDP1 (0.54) | TDP1TSHRTHRBALDH1A1 | |
| SCHEMBL11240653 | 0.91 | TDP1 (0.54) | TDP1TSHRTHRBALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8895229-B2 | Composition for formation of upper layer film, and method for formation of photoresist pattern | JSR CORPORATION (JP) | 2014-11-25 | — | — | US | disclosed |
| US-8435718-B2 | Upper layer-forming composition and photoresist patterning method | JSR CORPORATION (JP) | 2013-05-07 | — | — | US | disclosed |
| US-20120028198-A1 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2012-02-02 | — | — | US | disclosed |
| US-7781142-B2 | Copolymer and top coating composition | JSR CORPORATION (JP) | 2010-08-24 | — | — | US | disclosed |
| US-20100021852-A1 | COMPOSITION FOR FORMATION OF UPPER LAYER FILM, AND METHOD FOR FORMATION OF PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2010-01-28 | — | — | US | disclosed |
| US-20080038661-A1 | Copolymer and Top Coating Composition | JSR CORPORATION (JP) | 2008-02-14 | — | — | US | disclosed |
| US-4310397-A | SUSTAINED RELEASE; PREPARED BY IRRADIATION POLYMERIZATION | JAPAN ATOMIC ENERGY RESEARCH INSTITUTE (JP) | 1982-01-12 | — | — | US | disclosed |