Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 2/20 | 0.48 |
| ▸ | AMY1A | P0DUB6 | 1/20 | 0.45 |
| ▸ | CSNK2A1 | P68400 | 1/20 | 0.43 |
| ▸ | POLB | P06746 | 2/20 | 0.42 |
| ▸ | GAA | P10253 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.41 |
| ▸ | EYA2 | O00167 | 1/20 | 0.41 |
| ▸ | APP | P05067 | 1/20 | 0.41 |
| ▸ | ACE | P12821 | 1/20 | 0.41 |
| ▸ | SRC | P12931 | 1/20 | 0.41 |
| ▸ | PRKCI | P41743 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.39 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.39 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | DRD1 | P21728 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL935126 | 0.98 | HTT (0.47) | HTTAMY1ACSNK2A1POLBGAA | |
| SCHEMBL23629772 | 0.98 | HTT (0.47) | HTTAMY1ACSNK2A1POLBGAA | |
| SCHEMBL935095 | 0.98 | HTT (0.47) | HTTAMY1ACSNK2A1POLBGAA | |
| Hydrochloric Acid SCHEMBL934885 | 0.98 | HTT (0.47) | HTTAMY1ACSNK2A1POLBGAA | |
| Hydrochloric Acid SCHEMBL2794700 | 0.97 | HTT (0.46) | HTTAMY1ACSNK2A1POLBGAA | |
| SCHEMBL3962618 | 0.95 | HTT (0.47) | HTTAMY1ACSNK2A1POLBGAA | |
| SCHEMBL16660357 | 0.93 | HTT (0.52) | HTTAMY1ACSNK2A1GAAMAPT | |
| SCHEMBL23425468 | 0.90 | POLB (0.42) | HTTAMY1ACSNK2A1POLBGAA | |
| SCHEMBL22693634 | 0.89 | HTT (0.41) | HTTAMY1ACSNK2A1POLBGAA | |
| SCHEMBL5268211 | 0.89 | SRC (0.43) | HTTCSNK2A1POLBGAAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0858102-B1 | Surface treatment composition and method for treating surface of substrate by using the same | MITSUBISHI CHEM CORP (JP) | 2007-07-25 | — | — | EP | claimed |
| EP-3848349-B1 | A PROCESS FOR THE PREPARATION OF SALTS OF N,N'-DISUBSTITUTED ETHYLENEDIAMINE-N,N'-DIACETIC ACID DERIVATIVES AND THEIR USE | PRZED PRODUKCYJNO CONSULTINGOWE ADOB SP Z O O (PL) | 2023-03-15 | — | — | EP | disclosed |
| EP-3848349-A1 | A PROCESS FOR THE PREPARATION OF SALTS OF N,N'-DISUBSTITUTED ETHYLENEDIAMINE-N,N'-DIACETIC ACID DERIVATIVES AND THEIR USE | Przedsiebiorstwo Produkcyjno-Consultingowe ADOB Sp. z o.o. Sp. jawna (PL) | 2021-07-14 | — | — | EP | disclosed |
| US-10927262-B2 | Method for producing oxidized carbon black aqueous dispersion, and method for producing oxidized carbon black aqueous dispersion for inkjet ink | TOKAI CARBON CO., LTD. (JP) | 2021-02-23 | — | — | US | disclosed |
| US-20180022926-A1 | METHOD FOR PRODUCING OXIDIZED CARBON BLACK AQUEOUS DISPERSION, AND METHOD FOR PRODUCING OXIDIZED CARBON BLACK AQUEOUS DISPERSION FOR INKJET INK | TOKAI CARBON CO., LTD. (JP) | 2018-01-25 | — | — | US | disclosed |
| EP-3252111-A1 | METHOD FOR MANUFACTURING AQUEOUS DISPERSION OF OXIDIZED CARBON BLACK, AND METHOD FOR MANUFACTURING AQUEOUS DISPERSION OF OXIDIZED CARBON BLACK FOR INKJET INK | Tokai Carbon Co., Ltd. (JP) | 2017-12-06 | — | — | EP | disclosed |
| EP-1715510-B2 | SUBSTRATE CLEANING LIQUID FOR SEMICONDUCTOR DEVICE AND CLEANING METHOD | MITSUBISHI CHEM CORP (JP) | 2016-02-24 | — | — | EP | disclosed |
| EP-2039679-B1 | A process for the preparation of N,N'-bis(2-hydroxybenzyl)ethylenediamine-N,N'-diacetic acid and its derivatives | PRZED PROD CONSULTINGOWE ADOB SP Z O O SP K (PL) | 2015-08-12 | — | — | EP | disclosed |
| US-8629293-B2 | Process for the preparation of FE(III) chelates of N,N′-DI(2-hydroxybenzyl)-ethylenediamine-N,N′-diacetic acid and its derivatives | PRZEDSIEBIORSTWO PRODUKCYJNO-CONSULTINGOWE ADOB SP. Z O.O. SP. K. (PL) | 2014-01-14 | — | — | US | disclosed |
| US-8431734-B2 | Process for the preparation of N,N′-bis(2-hydroxybenzyl)ethylenediamine-N,N′-diacetic acid and its derivatives | Przedsiebiorstwo Produkeyjno-Consultingowe Adob SP. Z O.O. SP. K. (PL) | 2013-04-30 | — | — | US | disclosed |
| EP-1715510-A1 | SUBSTRATE CLEANING LIQUID FOR SEMICONDUCTOR DEVICE AND CLEANING METHOD | Mitsubishi Chemical Corporation (JP) | 2006-10-25 | — | — | EP | disclosed |
| US-6896744-B2 | Method for cleaning a surface of a substrate | MITSUBISHI CHEMICAL CORPORATION (JP) | 2005-05-24 | — | — | US | disclosed |
| US-20050020463-A1 | Cleaning solution for cleaning substrate for semiconductor devices and cleaning method using the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2005-01-27 | — | — | US | disclosed |
| US-20040099290-A1 | Method for cleaning a surface of a substrate | MITSUBISHI CHEMICAL CORPORATION (JP) | 2004-05-27 | — | — | US | disclosed |
| EP-1389496-A1 | METHOD FOR CLEANING SURFACE OF SUBSTRATE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2004-02-18 | — | — | EP | disclosed |
| EP-1342777-A1 | Substrate cleaning liquid media and cleaning method | MITSUBISHI CHEMICAL CORPORATION (JP) | 2003-09-10 | — | — | EP | disclosed |
| US-20030144163-A1 | Substrate surface cleaning liquid mediums and cleaning method | MITSUBISHI CHEMICAL CORPORATION (JP) | 2003-07-31 | — | — | US | disclosed |
| US-6228179-B1 | CONTACTING A SEMI-CONDUCTOR SUBSTRATE WITH A SURFACE TREATMENT COMPOSITION CONTAINING A COMPLEXING AGENT AS A METAL DEPOSITION PREVENTIVE IN A LIQUID MEDIUM, IN WHICH THE COMPLEXING AGENT IS AN ETHYLENEDIAMINEPHENOL DERIVATIVE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2001-05-08 | — | — | US | disclosed |
| US-6143706-A | FOR CLEANING SUBSTRATES SUCH AS SEMICONDUCTORS; PREVENTS SUBSTRATE SURFACE FROM BEING CONTAMINATED WITH METAL IMPURITIES FROM THE SURFACE TREATMENT COMPOSITION AND STABLY PROVIDES CLEAN SUBSTRATE SURFACE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2000-11-07 | — | — | US | disclosed |
| EP-0858102-A2 | Surface treatment composition and method for treating surface of substrate by using the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 1998-08-12 | — | — | EP | disclosed |