⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30800 | 0.78 | — | — | |
| SCHEMBL170397 | 0.78 | — | — | |
| Ammonia Solution, Strong SCHEMBL10428699 | 0.76 | — | — | |
| Hydrochloric Acid SCHEMBL11133442 | 0.76 | — | — | |
| Hypophosphorous Acid SCHEMBL4787761 | 0.70 | — | — | |
| Ethylene Glycol SCHEMBL11666615 | 0.69 | TSHR (0.30) | — | |
| SCHEMBL1049948 | 0.67 | — | — | |
| SCHEMBL9281114 | 0.67 | — | — | |
| Sulfuric Acid SCHEMBL2358321 | 0.67 | CA5A (0.33) | — | |
| SCHEMBL15569875 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2742103-B1 | A PROCESS FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES COMPRISING THE CHEMICAL MECHANICAL POLISHING OF ELEMENTAL GERMANIUM AND/OR Si1-xGex MATERIAL IN THE PRESENCE OF A CMP COMPOSITION COMPRISING A SPECIFIC ORGANIC COMPOUND | BASF SE (DE) | 2016-09-21 | — | — | EP | disclosed |
| US-9443739-B2 | Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing of elemental germanium and/or Si1-xGex material in the presence of a CMP composition comprising a specific organic compound | BASF SE (DE) | 2016-09-13 | — | — | US | disclosed |
| US-20140170852-A1 | PROCESS FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES COMPRISING THE CHEMICAL MECHANICAL POLISHING OF ELEMENTAL GERMANIUM AND/OR SI1-XGEX MATERIAL IN THE PRESENCE OF A CMP COMPOSITION COMPRISING A SPECIFIC ORGANIC COMPOUND | BASF SE (DE) | 2014-06-19 | — | — | US | disclosed |
| EP-2742103-A2 | A PROCESS FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES COMPRISING THE CHEMICAL MECHANICAL POLISHING OF ELEMENTAL GERMANIUM AND/OR Si1-xGex MATERIAL IN THE PRESENCE OF A CMP COMPOSITION COMPRISING A SPECIFIC ORGANIC COMPOUND | BASF SE (DE) | 2014-06-18 | — | — | EP | disclosed |
| WO-2013018015-A2 | A PROCESS FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES COMPRISING THE CHEMICAL MECHANICAL POLISHING OF ELEMENTAL GERMANIUM AND/OR Si1-XGeX MATERIAL IN THE PRESENCE OF A CMP COMPOSITION COMPRISING A SPECIFIC ORGANIC COMPOUND | BASF SE (DE) | 2013-02-07 | — | — | WO | disclosed |
| EP-2554613-A1 | A process for the manufacture of semiconductor devices comprising the chemical mechanical polishing of elemental germanium and/or si1-xgex material in the presence of a cmp composi-tion comprising a specific organic compound | BASF SE (DE) | 2013-02-06 | — | — | EP | disclosed |
| US-7230115-B1 | Preparation of compounds useful for the detection of hypoxia | THE TRUSTEES OF THE UNIVERSITY OF PENNSYLVANIA (US) | 2007-06-12 | — | — | US | disclosed |