Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACE2 | Q9BYF1 | 1/20 | 0.75 |
| ▸ | CA12 | O43570 | 4/20 | 0.48 |
| ▸ | CA9 | Q16790 | 4/20 | 0.48 |
| ▸ | CA6 | P23280 | 3/20 | 0.48 |
| ▸ | CA7 | P43166 | 3/20 | 0.48 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.48 |
| ▸ | CA5B | Q9Y2D0 | 3/20 | 0.48 |
| ▸ | CA2 | P00918 | 3/20 | 0.48 |
| ▸ | LMNA | P02545 | 2/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.48 |
| ▸ | CA1 | P00915 | 2/20 | 0.48 |
| ▸ | CA3 | P07451 | 2/20 | 0.48 |
| ▸ | CA4 | P22748 | 2/20 | 0.48 |
| ▸ | CA5A | P35218 | 2/20 | 0.48 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.48 |
| ▸ | TP53 | P04637 | 1/20 | 0.48 |
| ▸ | CARM1 | Q86X55 | 1/20 | 0.46 |
| ▸ | PRMT6 | Q96LA8 | 1/20 | 0.46 |
| ▸ | PRMT8 | Q9NR22 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12976324 | 1.00 | ACE2 (0.75) | ACE2CA12CA9CA6CA7 | |
| SCHEMBL10904240 | 0.98 | ACE2 (0.78) | ACE2CA12CA9CA6CA7 | |
| SCHEMBL10708182 | 0.98 | ACE2 (0.78) | ACE2CA12CA9CA6CA7 | |
| SCHEMBL239132 | 0.98 | ACE2 (0.78) | ACE2CA12CA9CA6CA7 | |
| SCHEMBL3913565 | 0.96 | ACE2 (0.82) | ACE2CA12CA9CA6CA7 | |
| SCHEMBL8308932 | 0.89 | ACE2 (0.65) | ACE2CA12CA9CA6CA7 | |
| SCHEMBL2570372 | 0.89 | ACE2 (0.95) | ACE2CA12CA9CA6CA7 | |
| SCHEMBL5705876 | 0.87 | ACE2 (0.68) | ACE2CA12CA9CA6CA7 | |
| SCHEMBL8307200 | 0.87 | ACE2 (0.61) | ACE2CA12CA9CA6CA7 | |
| SCHEMBL1690928 | 0.86 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112745522-B | Preparation method of surface-modified electrostatic spinning aerogel, obtained aerogel and application | 北京化工大学 | 2022-08-02 | — | — | CN | claimed |
| US-20180304191-A1 | METHOD FOR THE SELECTIVE REMOVAL OF HYDROGEN SULFIDE | BASF SE (DE) | 2018-10-25 | — | — | US | claimed |
| US-7153630-B2 | Resist with reduced line edge roughness | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2006-12-26 | — | — | US | claimed |
| US-20060078820-A1 | Resist with reduced line edge roughness | MASS INSTITUTE OF TECHNOLOGY (MIT) (US) | 2006-04-13 | — | — | US | claimed |
| US-20030036015-A1 | Resist with reduced line edge roughness | AIR FORCE, UNITED STATES | 2003-02-20 | — | — | US | claimed |
| WO-2002091084-A2 | RESIST WITH REDUCED LINE EDGE ROUGHNESS | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2002-11-14 | — | — | WO | claimed |
| CN-1119868-A | Rare earth compounds and their preparation | TIMOTHY JOHN LEEDHAM (FR) | 1996-04-03 | — | — | CN | claimed |
| CN-114959712-A | Vapor phase corrosion inhibitor and preparation method thereof | 中国石油化工股份有限公司 | 2022-08-30 | — | — | CN | disclosed |
| CN-112745522-B | Preparation method of surface-modified electrostatic spinning aerogel, obtained aerogel and application | 北京化工大学 | 2022-08-02 | — | — | CN | disclosed |
| US-20220011670-A1 | RESIST UNDERLAYER SURFACE MODIFICATION | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2022-01-13 | — | — | US | disclosed |
| CN-112745522-A | Preparation method of surface-modified electrostatic spinning aerogel, obtained aerogel and application | 北京化工大学 | 2021-05-04 | — | — | CN | disclosed |
| US-20180304191-A1 | METHOD FOR THE SELECTIVE REMOVAL OF HYDROGEN SULFIDE | BASF SE (DE) | 2018-10-25 | — | — | US | disclosed |
| EP-2935198-A2 | METHOD FOR STABILISING POLYMERISABLE COMPOUNDS | BASF SE (DE) | 2015-10-28 | — | — | EP | disclosed |
| US-7423102-B2 | Star polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-09-09 | — | — | US | disclosed |
| US-7153630-B2 | Resist with reduced line edge roughness | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2006-12-26 | — | — | US | disclosed |
| US-20060078820-A1 | Resist with reduced line edge roughness | MASS INSTITUTE OF TECHNOLOGY (MIT) (US) | 2006-04-13 | — | — | US | disclosed |
| US-20060014913-A1 | Star polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-01-19 | — | — | US | disclosed |
| US-6936398-B2 | Resist with reduced line edge roughness | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2005-08-30 | — | — | US | disclosed |
| US-20030036015-A1 | Resist with reduced line edge roughness | AIR FORCE, UNITED STATES | 2003-02-20 | — | — | US | disclosed |
| WO-2002091084-A2 | RESIST WITH REDUCED LINE EDGE ROUGHNESS | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2002-11-14 | — | — | WO | disclosed |