SCHEMBL545869

SCHEMBL545869

BrC(Br)(Br)c1ccccc1C(Br)(Br)Br

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 1/20 0.37
ALDH1A1 P00352 9/20 0.36
TSHR P16473 5/20 0.36
TDP1 Q9NUW8 3/20 0.36
CYP2A6 P11509 2/20 0.33
ALOX12 P18054 1/20 0.33
CA2 P00918 2/20 0.32
CA1 P00915 1/20 0.32
CA5A P35218 1/20 0.32
CA9 Q16790 1/20 0.32
KCNN4 O15554 2/20 0.31
POLB P06746 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
TRPA1 O75762 2/20 0.30
LMNA P02545 1/20 0.30
ALOX5 P09917 1/20 0.30
MAPK1 P28482 1/20 0.30
BBOX1 O75936 1/20 0.30
EHMT2 Q96KQ7 1/20 0.30
EHMT1 Q9H9B1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9321262 0.84 ALDH1A1 (0.52) ALDH1A1TSHRTDP1ALOX12CA2
SCHEMBL2266185 0.79 CA1 (0.46) ALDH1A1TSHRTDP1CA2CA1
SCHEMBL8728885 0.79 CA1 (0.32) ALDH1A1TSHRTDP1CA2CA1
SCHEMBL3868228 0.77 CYP3A4 (0.50) ALDH1A1TSHRTDP1CA2CA1
SCHEMBL30417821 0.77 ALDH1A1 (0.59) ALDH1A1TSHRTDP1CA2CA1
SCHEMBL7098053 0.77 TSHR (0.50) MAOBALDH1A1TSHRTDP1CYP2A6
SCHEMBL11215017 0.77 KCNN4 (0.42) ALDH1A1CA2CA1CA5ACA9
SCHEMBL8030449 0.77
SCHEMBL12925871 0.77 TSHR (0.50) ALDH1A1TSHRTDP1CYP2A6ALOX12
SCHEMBL5250573 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 89 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119668028-A Negative photoresist composition, application thereof and imaging method 福建泓光半导体材料有限公司 2025-03-21 CN claimed
CN-122072436-A Negative photosensitive resin composition, cured film, and resist film DIC株式会社 2026-05-22 CN disclosed
CN-119668028-A Negative photoresist composition, application thereof and imaging method 福建泓光半导体材料有限公司 2025-03-21 CN disclosed
CN-119575759-A Positive photosensitive resin composition, photosensitive film, resist underlayer film, resist permanent film, and method for producing film DIC株式会社 2025-03-07 CN disclosed
CN-118011733-A Positive photosensitive resin composition, resist film, resist underlayer film, and resist permanent film DIC株式会社 2024-05-10 CN disclosed
CN-113348188-B Phenolic hydroxyl group-containing resin, photosensitive composition, resist film, curable composition, and cured product DIC株式会社 2024-05-10 CN disclosed
CN-111788206-B Compound and polymer compound containing the same 国立研究开发法人科学技术振兴机构 2024-03-08 CN disclosed
CN-117075428-A Negative photosensitive resin composition DIC株式会社 2023-11-17 CN disclosed
CN-110959138-B Resist material DIC株式会社 2023-06-30 CN disclosed
CN-115480447-A Negative photosensitive resin composition DIC株式会社 2022-12-16 CN disclosed
US-5744678-A NICKEL COMPOUND, ORGANOPHOSPHORUS COMPOUND, ORGANOALUMINUM COMPOUND, CARBON-HALOGEN COMPOUNDS; CATALYST SELECTIVITY NIPPON OIL CO., LTD. (JP) 1998-04-28 US disclosed
US-5728641-A Catalyst component for the polymerization of olefins NIPPON OIL COMPANY, LIMITED (JP) 1998-03-17 US disclosed
EP-0758563-A1 OLEFIN OLIGOMERIZATION CATALYST AND PROCESS FOR THE PREPARATION OF OLEFIN OLIGOMER USING IT NIPPON OIL COMPANY, LTD. (JP) 1997-02-19 EP disclosed
EP-0587440-A2 Catalyst component for the polymerisation of olefins and process for preparing olefin polymers using same NIPPON OIL COMPANY, LIMITED (JP) 1994-03-16 EP disclosed
US-5292614-A Bis(triaminotriazine) MITSUBISHI KASEI CORPORATION (JP) 1994-03-08 US disclosed
US-5286600-A Negative photosensitive composition and method for forming a resist pattern by means thereof MITSUBISHI KASEI CORPORATION (JP) 1994-02-15 US disclosed
US-4990653-A Curable; plastic lenses; transparency, optical uniformity MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1991-02-05 US disclosed
US-4171456-A α,α'-Bis(2-hydroxyethoxy)-2,3,5,6-tetrabromo-p-xylene ETHYL CORPORATION (US) 1979-10-16 US disclosed
US-4086191-A ORGANIC BROMINE NUCLEATING AGENT BASF AKTIENGESELLSCHAFT (DT) 1978-04-25 US disclosed
US-4013817-A HALOGENATED AROMATIC HYDROCARBON BRIDGESTONE TIRE COMPANY LIMITED (JA) 1977-03-22 US disclosed