SCHEMBL5459466

SCHEMBL5459466

C=CCc1cccc(S(=O)(=O)c2cccc(CC=C)c2O)c1O

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 1/20 0.59
GABRB2 P47870 1/20 0.59
POLB P06746 2/20 0.47
AKR1B1 P15121 1/20 0.46
KMT2A Q03164 7/20 0.44
MEN1 O00255 6/20 0.44
MAPT P10636 6/20 0.44
MAPK1 P28482 2/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
GAA P10253 5/20 0.42
LMNA P02545 5/20 0.42
ALDH1A1 P00352 2/20 0.42
ELANE P08246 1/20 0.42
KDM4E B2RXH2 4/20 0.40
CASP1 P29466 1/20 0.40
HSD17B10 Q99714 1/20 0.40
HTT P42858 4/20 0.39
ALOX12 P18054 3/20 0.39
CYP1A2 P05177 1/20 0.39
CYP3A4 P08684 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8658348 0.88 GABRA1 (0.58) GABRA1GABRB2POLBAKR1B1KMT2A
SCHEMBL21082747 0.86 GABRA1 (0.45) GABRA1GABRB2POLBAKR1B1KMT2A
SCHEMBL21082748 0.86 GABRA1 (0.45) GABRA1GABRB2POLBAKR1B1KMT2A
SCHEMBL5675435 0.84 POLB (0.71) GABRA1GABRB2POLBAKR1B1KMT2A
SCHEMBL27822021 0.84 GABRA1 (0.39) GABRA1GABRB2POLBAKR1B1L3MBTL1
SCHEMBL6431995 0.82 GABRA1 (0.51) GABRA1GABRB2POLBAKR1B1KMT2A
SCHEMBL636219 0.81 POLB (0.44) GABRA1GABRB2POLBKMT2AMEN1
SCHEMBL168974 0.80 GABRA1 (0.79) GABRA1GABRB2AKR1B1KMT2AMEN1
Sulfuric Acid SCHEMBL10765800 0.79 GABRA1 (0.59) GABRA1GABRB2POLBAKR1B1KMT2A
SCHEMBL8850517 0.76 GABRA1 (0.68) GABRA1GABRB2POLBAKR1B1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6890614-B2 Metal salt activators for use in leuco dye compositions HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) 2005-05-10 US claimed
US-20190203048-A1 Maleimide Resin Composition, Prepreg, Cured Product Of Same And Semiconductor Device NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2019-07-04 US disclosed
CN-107849221-A Epoxy resin, modified epoxy resin, epoxy resin composition and cured product thereof 日本化药株式会社 2018-03-27 CN disclosed
US-20070042907-A1 Dispersion composition and recording material CHEMIPRO KASEI KAISHA, LTD. (JP) 2007-02-22 US disclosed
EP-1681174-A1 DISPERSION COMPOSITION AND RECORDING MATERIAL Chemipro Kasei Kaisha, Ltd. (JP) 2006-07-19 EP disclosed
US-6740466-B1 HIGH SENSITIVITY TO UV, VISIBLE, ANDINFRARED; FOGGING OF THE BACKGROUND IS REDUCED; CLARITY AND HIGH CONTRAST; ADDITION POLYMERIZABLE COMPOUND, AN INDOLE-PYRIMIDINETRIONE METHINE DYE, AN ANIONIC ORGANOBORON COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 2004-05-25 US disclosed
US-20020051926-A1 Cyanine-based organic dyes, photopolymerizable compositions, and recording materials FUJI PHOTO FILM CO., LTD. (JP) 2002-05-02 US disclosed
US-4874740-A ARYL DIESTERS,DIETHERS AND DIHYDROXYARYL SULFONES; SENSITIZERS AND DEVELOPERS; COLOR DEVELOPMENT BY HEATING MITSUBISHI PAPER MILLS, LTD. (JP) 1989-10-17 US disclosed
US-4742042-A Thermosensitive recording material MITSUBISHI PAPER MILLS, LTD. (JP) 1988-05-03 US disclosed