Monoethanolamine

Monoethanolamine

SCHEMBL5459834

CCCCOP(=O)(OCCCC)OP(=O)(O)O.NCCO

nearest known ligand 0.53

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

MPL

The experimentally established mechanism targets of Monoethanolamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
▸ CYP3A4 P08684 2/20 0.53
▸ LPAR3 Q9UBY5 5/20 0.47
▸ LPAR1 Q92633 3/20 0.47
▸ LPAR2 Q9HBW0 3/20 0.47
▸ TSHR P16473 1/20 0.43
▸ GABBR2 O75899 1/20 0.39
▸ GABRR1 P24046 1/20 0.39
▸ GABBR1 Q9UBS5 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5455630 0.91 CYP3A4 (0.55) CYP3A4LPAR3LPAR1LPAR2TSHR
SCHEMBL1408422 0.89 CYP3A4 (0.67) CYP3A4LPAR3LPAR1LPAR2TSHR
Ammonia Solution, Strong SCHEMBL11785218 0.87 CYP3A4 (0.64) CYP3A4LPAR3LPAR1LPAR2TSHR
Monoethanolamine SCHEMBL5455622 0.86 LPAR3 (0.47) CYP3A4LPAR3LPAR1LPAR2GABBR2
SCHEMBL11801496 0.85 CYP3A4 (0.61) CYP3A4LPAR3LPAR1LPAR2TSHR
SCHEMBL27446954 0.85 CYP3A4 (0.67) CYP3A4LPAR3LPAR1LPAR2TSHR
SCHEMBL7651599 0.84 LPAR3 (0.68) CYP3A4LPAR3LPAR1LPAR2TSHR
SCHEMBL27817486 0.84 LPAR3 (0.68) CYP3A4LPAR3LPAR1LPAR2TSHR
SCHEMBL1582975 0.83 LPAR3 (0.67) CYP3A4LPAR3LPAR1LPAR2TSHR
SCHEMBL21694832 0.83 CYP3A4 (0.58) CYP3A4LPAR3LPAR1LPAR2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070210476-A1 Machinable Resin Molded Product, Material For Forming The Same, And Model Made Of The Same SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2007-09-13 — — US disclosed
EP-1728832-A1 MOLDING OF RESIN FOR CUTTING OPERATION, MATERIAL FOR FORMATION THEREOF AND MODEL Sanyo Chemical Industries, Ltd. (JP) 2006-12-06 — — EP disclosed
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