Monoethanolamine

Monoethanolamine

SCHEMBL5455622

CCCCOP(=O)(O)OP(=O)(O)O.NCCO

nearest known ligand 0.49

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

MPL

The experimentally established mechanism targets of Monoethanolamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
▸ LPAR3 Q9UBY5 6/20 0.47
▸ LPAR1 Q92633 4/20 0.47
▸ LPAR2 Q9HBW0 3/20 0.47
▸ BTN3A1 O00481 3/20 0.46
▸ CYP3A4 P08684 1/20 0.44
▸ MVD P53602 2/20 0.41
▸ GABBR2 O75899 1/20 0.39
▸ GABRR1 P24046 1/20 0.39
▸ GABBR1 Q9UBS5 1/20 0.39
▸ ITPR3 Q14573 1/20 0.39
▸ ITPR1 Q14643 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL379135 0.89 LPAR3 (0.57) LPAR3LPAR1LPAR2BTN3A1CYP3A4
Ammonia Solution, Strong SCHEMBL28249850 0.87 LPAR3 (0.55) LPAR3LPAR1LPAR2BTN3A1CYP3A4
Di(Hydroxyethyl)Ether SCHEMBL21694831 0.86 TSHR (0.53) LPAR3LPAR1LPAR2BTN3A1CYP3A4
Monoethanolamine SCHEMBL5459834 0.86 CYP3A4 (0.53) LPAR3LPAR1LPAR2CYP3A4GABBR2
SCHEMBL18798621 0.85 LPAR3 (0.53) LPAR3LPAR1LPAR2BTN3A1CYP3A4
SCHEMBL10935345 0.85 LPAR3 (0.53) LPAR3LPAR1LPAR2BTN3A1CYP3A4
SCHEMBL2869539 0.83 LPAR3 (0.67) LPAR3LPAR1LPAR2BTN3A1CYP3A4
SCHEMBL5705550 0.82 LPAR3 (0.50) LPAR3LPAR1LPAR2BTN3A1CYP3A4
Monoethanolamine SCHEMBL30909389 0.82 LPAR3 (0.60) LPAR3LPAR1LPAR2
Monoethanolamine SCHEMBL10715779 0.82 LPAR3 (0.60) LPAR3LPAR1LPAR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070210476-A1 Machinable Resin Molded Product, Material For Forming The Same, And Model Made Of The Same SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2007-09-13 — — US disclosed
EP-1728832-A1 MOLDING OF RESIN FOR CUTTING OPERATION, MATERIAL FOR FORMATION THEREOF AND MODEL Sanyo Chemical Industries, Ltd. (JP) 2006-12-06 — — EP disclosed
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