SCHEMBL546259

SCHEMBL546259

CCCCCCCCCCCc1nc(CCc2nc(N)nc(N)n2)c[nH]1

nearest known ligand 0.45

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
▸ CASP1 P29466 1/20 0.38
▸ ALDH1A1 P00352 1/20 0.36
▸ PKM P14618 1/20 0.36
▸ HPGD P15428 1/20 0.36
▸ PDPK1 O15530 1/20 0.36
▸ PI4KA P42356 1/20 0.36
▸ PI4K2B Q8TCG2 1/20 0.36
▸ PI4K2A Q9BTU6 1/20 0.36
▸ PI4KB Q9UBF8 1/20 0.36
▸ KCNH2 Q12809 1/20 0.36
▸ DHFR P00374 1/20 0.35
▸ GPR84 Q9NQS5 3/20 0.35
▸ TLR8 Q9NR97 1/20 0.35
▸ TLR7 Q9NYK1 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16460924 1.00 CASP1 (0.38) CASP1ALDH1A1PKMHPGDPDPK1
SCHEMBL5983208 0.83 CASP1 (0.39) CASP1DHFR
SCHEMBL10697416 0.83 KCNH2 (0.50) ALDH1A1PKMHPGDKCNH2GPR84
SCHEMBL28413083 0.83 KCNH2 (0.50) ALDH1A1PKMHPGDKCNH2GPR84
SCHEMBL28300118 0.83 KCNH2 (0.50) ALDH1A1PKMHPGDKCNH2GPR84
SCHEMBL9817100 0.83 KCNH2 (0.50) ALDH1A1PKMHPGDKCNH2GPR84
SCHEMBL9133514 0.83 KCNH2 (0.50) ALDH1A1PKMHPGDKCNH2GPR84
SCHEMBL730079 0.83 KCNH2 (0.50) ALDH1A1PKMHPGDKCNH2GPR84
SCHEMBL4445935 0.83 KCNH2 (0.50) ALDH1A1PKMHPGDKCNH2GPR84
SCHEMBL27700043 0.83 KCNH2 (0.50) ALDH1A1PKMHPGDKCNH2GPR84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 181 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3331959-A1 ANIONIC CURABLE COMPOSITIONS Designer Molecules, Inc. (US) 2018-06-13 — — EP claimed
WO-2017027482-A1 ANIONIC CURABLE COMPOSITIONS DESIGNER MOLECULES, INC. (US) 2017-02-16 — — WO claimed
US-7067930-B2 Liquid epoxy resin composition and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-06-27 — — US claimed
US-20060051587-A1 Thermosetting resin composition and adhesive film SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-03-09 — — US claimed
US-6558812-B2 Adherent to the surface of silicon flip chips, especially polyimide resins and nitride films; shock resistance SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-05-06 — — US claimed
US-6534193-B2 Containing a low molecular weight indene-styrene or indene-chroman-styrene copolymer; semiconductor device sealed with the cured product of the liquid epoxy resin SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-03-18 — — US claimed
US-20020089071-A1 Liquid epoxy resin composition and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-07-11 — — US claimed
US-20020077421-A1 Liquid epoxy resin composition and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-06-20 — — US claimed
US-20020045709-A1 Liquid epoxy resin composition and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-04-18 — — US claimed
US-20250279392-A1 METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE RESONAC CORPORATION (JP) 2025-09-04 — — US disclosed
WO-2025023309-A1 COMPOSITION FOR FORMING CURED FILM, ALIGNMENT MATERIAL, AND PHASE-DIFFERENCE MATERIAL 日産化学株式会社 2025-01-30 — — WO disclosed
CN-119053888-A Resin composition for thermosetting photo-alignment film 日产化学株式会社 2024-11-29 — — CN disclosed
CN-118715462-A Resin composition for thermosetting photo-alignment film 日产化学株式会社 2024-09-27 — — CN disclosed
US-20240240059-A1 EPOXY RESIN MODIFIER, EPOXY RESIN COMPOSITION CONTAINING SAME, ADHESIVE COMPOSED OF EPOXY RESIN COMPOSITION, AND RESIN CURED PRODUCT OBTAINED BY CURING EPOXY RESIN COMPOSITION OTSUKA CHEMICAL CO., LTD. (JP) 2024-07-18 — — US disclosed
US-20030069333-A1 Adhesive composition FUJITSU LIMITED (JP) 2003-04-10 — — US disclosed
US-20020077421-A1 Liquid epoxy resin composition and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-06-20 — — US disclosed
EP-0949286-A1 CURATIVES FOR EPOXY RESIN, CURING ACCELERATOR, AND EPOXY RESIN COMPOSITION NIPPON SODA CO., LTD. (JP) 1999-10-13 — — EP disclosed
EP-0448862-B1 Particulate spacers and a method for producing the same, and a method for producing a liquid crystal display cell by using the particulate spacers SEKISUI FINE CHEMICAL CO LTD (JP) 1996-12-11 — — EP disclosed
US-5130831-A Particulate spacers and liquid crystal display cells containing these spacers SEKISUI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1992-07-14 — — US disclosed
EP-0448862-A2 Particulate spacers and a method for producing the same, and a method for producing a liquid crystal display cell by using the particulate spacers SEKISUI FINE CHEMICAL CO., LTD. (JP) 1991-10-02 — — EP disclosed
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