SCHEMBL546388

SCHEMBL546388

Fc1ccc([S+](c2ccccc2)c2ccccc2)cc1.O=C(OCCCCCl)C(F)(F)S(=O)(=O)[O-]

nearest known ligand 0.33

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.33
PPARG P37231 1/20 0.31
PPARA Q07869 1/20 0.31
HDAC1 Q13547 1/20 0.31
HDAC2 Q92769 1/20 0.31
NPC1 O15118 1/20 0.31
KMT2A Q03164 1/20 0.31
BCHE P06276 2/20 0.31
HSD11B1 P28845 1/20 0.30
FKBP1A P62942 1/20 0.30
KDM4E B2RXH2 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547330 0.99 HDAC1 (0.33) TDP1PPARGPPARAHDAC1HDAC2
SCHEMBL546844 0.99 HDAC1 (0.33) TDP1PPARGPPARAHDAC1HDAC2
SCHEMBL546521 0.99 HDAC1 (0.33) TDP1PPARGPPARAHDAC1HDAC2
SCHEMBL546830 0.94 CA12 (0.31) NPC1KMT2A
SCHEMBL546613 0.94 CA12 (0.31) NPC1KMT2A
SCHEMBL547029 0.94 TDP1 (0.37) TDP1HDAC1HDAC2KMT2A
SCHEMBL547318 0.93 TDP1 (0.36) TDP1HDAC1HDAC2KMT2A
SCHEMBL546806 0.93 TDP1 (0.36) TDP1HDAC1HDAC2KMT2A
SCHEMBL546505 0.93 TDP1 (0.36) TDP1HDAC1HDAC2KMT2A
SCHEMBL546789 0.91 CPT1A (0.33) TDP1HDAC1HDAC2KMT2ABCHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed