SCHEMBL547330

SCHEMBL547330

Fc1ccc([S+](c2ccccc2)c2ccccc2)cc1.O=C(OCCCCCCCCCCCCCCCl)C(F)(F)S(=O)(=O)[O-]

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC1 Q13547 4/20 0.33
HDAC2 Q92769 4/20 0.33
TDP1 Q9NUW8 1/20 0.33
CA12 O43570 2/20 0.31
CA1 P00915 2/20 0.31
CA2 P00918 2/20 0.31
CA9 Q16790 2/20 0.31
PPARG P37231 1/20 0.31
PPARA Q07869 1/20 0.31
HDAC3 O15379 2/20 0.31
HDAC4 P56524 2/20 0.31
HDAC7 Q8WUI4 2/20 0.31
HDAC10 Q969S8 2/20 0.31
HDAC11 Q96DB2 2/20 0.31
HDAC8 Q9BY41 2/20 0.31
HDAC6 Q9UBN7 2/20 0.31
HDAC9 Q9UKV0 2/20 0.31
HDAC5 Q9UQL6 2/20 0.31
NPC1 O15118 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL546844 1.00 HDAC1 (0.33) HDAC1HDAC2TDP1CA12CA1
SCHEMBL546521 1.00 HDAC1 (0.33) HDAC1HDAC2TDP1CA12CA1
SCHEMBL546388 0.99 TDP1 (0.33) HDAC1HDAC2TDP1PPARGPPARA
SCHEMBL546830 0.96 CA12 (0.31) CA12CA1CA2CA9NPC1
SCHEMBL546613 0.96 CA12 (0.31) CA12CA1CA2CA9NPC1
SCHEMBL546806 0.94 TDP1 (0.36) HDAC1HDAC2TDP1CA12CA1
SCHEMBL546505 0.94 TDP1 (0.36) HDAC1HDAC2TDP1CA12CA1
SCHEMBL547318 0.94 TDP1 (0.36) HDAC1HDAC2TDP1CA12CA1
SCHEMBL547029 0.93 TDP1 (0.37) HDAC1HDAC2TDP1CA12CA1
SCHEMBL546410 0.91 KMT2A (0.33) HDAC1HDAC2TDP1CA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed