SCHEMBL546691

SCHEMBL546691

CCS(CC)(OS(=O)(=O)C(F)(F)C(=O)OCCCCCCCCCCl)C1CCCCC1=O

nearest known ligand 0.30

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CHRM2 P08172 1/20 0.30
CHRM4 P08173 1/20 0.30
CHRM1 P11229 1/20 0.30
CHRM3 P20309 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL546635 0.83 MAPT (0.39) CHRM2CHRM4CHRM1CHRM3
SCHEMBL546862 0.80 CHRM2 (0.30) CHRM2CHRM4CHRM1CHRM3
SCHEMBL547322 0.80 CHRM2 (0.30) CHRM2CHRM4CHRM1CHRM3
SCHEMBL547423 0.77
SCHEMBL547072 0.77
SCHEMBL546970 0.77 CHRM2 (0.30) CHRM2CHRM4CHRM1CHRM3
SCHEMBL546690 0.76 NAAA (0.30)
SCHEMBL547354 0.74 MAPT (0.39) CHRM2CHRM4CHRM1CHRM3
SCHEMBL546634 0.69 CHRM2 (0.33) CHRM2CHRM4CHRM1CHRM3
SCHEMBL546636 0.68 HCRTR1 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed