Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN1 | P18031 | 1/20 | 0.43 |
| ▸ | CA12 | O43570 | 6/20 | 0.42 |
| ▸ | CA1 | P00915 | 6/20 | 0.42 |
| ▸ | CA2 | P00918 | 6/20 | 0.42 |
| ▸ | CA9 | Q16790 | 6/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | GABBR2 | O75899 | 1/20 | 0.39 |
| ▸ | GABBR1 | Q9UBS5 | 1/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
| ▸ | KAT6A | Q92794 | 1/20 | 0.39 |
| ▸ | CES2 | O00748 | 1/20 | 0.39 |
| ▸ | CES1 | P23141 | 1/20 | 0.39 |
| ▸ | CA7 | P43166 | 1/20 | 0.38 |
| ▸ | HDAC1 | Q13547 | 2/20 | 0.37 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL5849612 | 0.89 | PTPN1 (0.44) | PTPN1CA12CA1CA2CA9 | |
| SCHEMBL6856441 | 0.89 | PTPN1 (0.39) | PTPN1CA12CA1CA2CA9 | |
| SCHEMBL6864543 | 0.88 | PTPN1 (0.38) | PTPN1CA12CA1CA2CA9 | |
| SCHEMBL686213 | 0.87 | PTPN1 (0.56) | PTPN1SMN1; SMN2KDM4EHPGDNPC1 | |
| SCHEMBL686323 | 0.86 | PTPN1 (0.54) | PTPN1SMN1; SMN2KDM4EHPGDNPC1 | |
| Bromide SCHEMBL2515173 | 0.86 | PTPN1 (0.54) | PTPN1SMN1; SMN2KDM4EHPGDNPC1 | |
| Trifluoromethanesulfonic Acid SCHEMBL3096657 | 0.84 | MAPT (0.37) | PTPN1CA12CA1CA2CA9 | |
| SCHEMBL19469347 | 0.84 | PTPN1 (0.47) | PTPN1CA12CA1CA2CA9 | |
| SCHEMBL2330933 | 0.84 | PTPN1 (0.47) | PTPN1CA12CA1CA2CA9 | |
| SCHEMBL2330936 | 0.83 | PTPN1 (0.49) | PTPN1CA12CA1CA2CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114779577-A | Cyclodextrin inclusion compound molecular glass photoresist | 南通林格橡塑制品有限公司 | 2022-07-22 | — | — | CN | claimed |
| CN-114442429-A | Molecular glass photoresist of metallocene compound and preparation method thereof | 南通林格橡塑制品有限公司 | 2022-05-06 | — | — | CN | claimed |
| US-7147801-B2 | Ink jet ink composition and method for security marking | VIDEOJET TECHNOLOGIES INC. (US) | 2006-12-12 | — | — | US | claimed |
| EP-1601729-B1 | INK JET INK COMPOSITION AND METHOD FOR SECURITY MAKING | VIDEOJET TECHNOLOGIES INC (US) | 2006-06-21 | — | — | EP | claimed |
| EP-1601729-A1 | INK JET INK COMPOSITION AND METHOD FOR SECURITY MAKING | Videojet Technologies Inc. (US) | 2005-12-07 | — | — | EP | claimed |
| US-20040220298-A1 | Ink jet ink composition and method for security marking | VIDEOJET TECHNOLOGIES INC. | 2004-11-04 | — | — | US | claimed |
| WO-2004081125-A1 | INK JET INK COMPOSITION AND METHOD FOR SECURITY MAKING | VIDEOJET TECHNOLOGIES INC. (US) | 2004-09-23 | — | — | WO | claimed |
| CN-115536776-A | Resin for photoresist, preparation method thereof and photoresist prepared from resin | 瑞红(苏州)电子化学品股份有限公司 | 2022-12-30 | — | — | CN | disclosed |
| CN-114779577-A | Cyclodextrin inclusion compound molecular glass photoresist | 南通林格橡塑制品有限公司 | 2022-07-22 | — | — | CN | disclosed |
| CN-114442429-A | Molecular glass photoresist of metallocene compound and preparation method thereof | 南通林格橡塑制品有限公司 | 2022-05-06 | — | — | CN | disclosed |
| EP-2138897-B1 | CONDUCTIVE ANTI-REFLECTION FILM, METHOD FOR FORMATION OF RESIST PATTERN | FUJITSU LTD (JP) | 2016-08-03 | — | — | EP | disclosed |
| US-20140246400-A1 | RESIN HAVING FLUORENE STRUCTURE AND MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-09-04 | — | — | US | disclosed |
| US-8795951-B2 | Material for forming resist sensitization film and production method of semiconductor device | FUJITSU LIMITED (JP) | 2014-08-05 | — | — | US | disclosed |
| EP-0856773-B1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL CO (JP) | 2001-06-13 | — | — | EP | disclosed |
| US-6245478-B1 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-06-12 | — | — | US | disclosed |
| US-6239231-B1 | HAS THE POLYMERIZATION UNIT OF 2-ALKYL-2-ADAMANTYL (METH)ACRYLATE AND ONE OR BOTH OF THE POLYMERIZATION UNIT OF 3-HYDROXY-1-ADAMANTYL (METH)ACRYLATE OR (METH)ACRYLONITRILE; ACID GENERATOR; SEMICONDUCTORS | SUMITOMO CHEMICAL, COMPANY LIMITED (JP) | 2001-05-29 | — | — | US | disclosed |
| EP-0982628-A2 | A chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-03-01 | — | — | EP | disclosed |
| US-5948592-A | MIXTURE OF CASEIN AND CALCIUM COMPOUND | FUJI CHEMICALS INDUSTRIAL CO., LTD. (JP) | 1999-09-07 | — | — | US | disclosed |
| EP-0909992-A1 | Water-soluble photoresist composition | Fuji Chemicals Industrial Co., Ltd. (JP) | 1999-04-21 | — | — | EP | disclosed |
| EP-0856773-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-08-05 | — | — | EP | disclosed |