SCHEMBL686213

SCHEMBL686213

O=C(C[S+]1CCCC1)c1ccc2ccccc2c1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 1/20 0.56
HPGD P15428 4/20 0.51
SMN1; SMN2 Q16637 3/20 0.51
KDM4E B2RXH2 3/20 0.51
CES2 O00748 1/20 0.50
CES1 P23141 1/20 0.50
ALDH1A1 P00352 3/20 0.49
NPC1 O15118 2/20 0.49
RAB9A P51151 1/20 0.49
HDAC1 Q13547 2/20 0.46
HDAC8 Q9BY41 1/20 0.46
CBX7 O95931 1/20 0.44
CDYL2 Q8N8U2 1/20 0.44
CDYL Q9Y232 1/20 0.44
CDY1; CDY1B Q9Y6F8 1/20 0.44
MAPT P10636 2/20 0.44
KMT2A Q03164 2/20 0.44
MEN1 O00255 1/20 0.44
EGFR P00533 1/20 0.44
TP53 P04637 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL2515173 0.98 PTPN1 (0.54) PTPN1HPGDSMN1; SMN2KDM4ECES2
SCHEMBL686323 0.98 PTPN1 (0.54) PTPN1HPGDSMN1; SMN2KDM4ECES2
SCHEMBL2330936 0.93 PTPN1 (0.49) PTPN1HPGDSMN1; SMN2KDM4ECES2
SCHEMBL19469347 0.90 PTPN1 (0.47) PTPN1HPGDSMN1; SMN2KDM4ECES2
SCHEMBL2330933 0.90 PTPN1 (0.47) PTPN1HPGDSMN1; SMN2KDM4ECES2
Sulfuric Acid SCHEMBL5849612 0.88 PTPN1 (0.44) PTPN1HPGDSMN1; SMN2KDM4ECES2
Trifluoromethanesulfonic Acid SCHEMBL546703 0.87 PTPN1 (0.43) PTPN1HPGDSMN1; SMN2KDM4ECES2
SCHEMBL685952 0.86 PTPN1 (0.51) PTPN1HPGDSMN1; SMN2KDM4ECES2
SCHEMBL924557 0.84 ALDH1A1 (0.46) PTPN1HPGDSMN1; SMN2KDM4EALDH1A1
SCHEMBL6856441 0.81 PTPN1 (0.39) PTPN1HPGDSMN1; SMN2KDM4ECES2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 795 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-2007507580-A 2007-03-29 JP claimed
US-7122294-B2 Photoacid generators with perfluorinated multifunctional anions 3M INNOVATIVE PROPERTIES COMPANY (US) 2006-10-17 US claimed
US-7078444-B2 Ionic photoacid generators with segmented hydrocarbonfluorocarbon sulfonate anions 3M INNOVATIVE PROPERTIES COMPANY (US) 2006-07-18 US claimed
EP-1625447-A2 PHOTOACID GENERATORS WITH PERFLUORINATED MULTIFUNCTIONAL ANIONS 3M Innovative Properties Company (US) 2006-02-15 EP claimed
US-20050158655-A1 Ionic photoacid generators with segmented hydrocarbonfluorocarbon sulfonate anions 3M INNOVATIVE PROPERTIES COMPANY 2005-07-21 US claimed
WO-2005057285-A1 THERMAL CURABLE ONE-LIQUID TYPE EPOXY RESIN COMPOSITION FOR OVER-COAT SAMYANGEMS CO., LTD. (KR) 2005-06-23 WO claimed
US-6841333-B2 Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions 3M INNOVATIVE PROPERTIES COMPANY (US) 2005-01-11 US claimed
WO-2004107051-A2 PHOTOACID GENERATORS WITH PERFLUORINATED MULTIFUNCTIONAL ANIONS 3M INNOVATIVE PROPERTIES COMPANY (US) 2004-12-09 WO claimed
US-20040234888-A1 Photoacid generators with perfluorinated multifunctional anions 3M INNOVATIVE PROPERTIES COMPANY 2004-11-25 US claimed
US-20040087690-A1 Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions 3M INNOVATIVE PROPERTIES COMPANY 2004-05-06 US claimed
US-20240210824-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-06-27 US disclosed
US-20240210824-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-06-27 US disclosed
US-11840503-B2 Salt, acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-12-12 US disclosed
US-11840503-B2 Salt, acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-12-12 US disclosed
US-11822241-B2 Salt, acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-21 US disclosed
US-20040017455-A1 Method of printing a receiving material with hot melt ink and an inkjet printer suitable for applying such a method OCE-TECHNOLOGIES B.V. (NL) 2004-01-29 US disclosed
EP-1378357-A1 A method of printing a receiving material with hot melt ink and an inkjet printer suitable for applying this method Océ-Technologies B.V. (NL) 2004-01-07 EP disclosed
EP-1378551-A1 A meltable ink for an inkjet printer and a method of selecting such an ink Océ-Technologies B.V. (NL) 2004-01-07 EP disclosed
JP-2003246786-A NOVEL SULFONIUM SALT COMPOUND, ITS MANUFACTURING METHOD, AND ITS USE TOYO KASEI KOGYO CO LTD 2003-09-02 JP disclosed
JP-2003246774-A NEW SULFONIUM SALT COMPOUND, METHOD FOR PRODUCING IT, AND USE OF IT TOYO KASEI KOGYO CO LTD 2003-09-02 JP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240210824-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SCO2, CBR1, OXGR1 PTPN1 2629/4885HPGD 984/4885SMN1; SMN2 4386/4885
US-11822241-B2 Salt, acid generator, resist composition and method for producing resist pattern H1-10, H1-0, CHRM1 PTPN1 1770/4885HPGD 3647/4885SMN1; SMN2 1965/4885
US-11840503-B2 Salt, acid generator, resist composition and method for producing resist pattern RER1, H1-0, CA7 PTPN1 1262/4885HPGD 3557/4885SMN1; SMN2 3407/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.