SCHEMBL547386

SCHEMBL547386

O=C(OCCBr)C(F)(F)S(=O)(=O)[O-].c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.34

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.34
HTT P42858 2/20 0.34
MEN1 O00255 2/20 0.34
TSHR P16473 1/20 0.34
CHRM2 P08172 4/20 0.32
CHRM1 P11229 4/20 0.32
CHRM3 P20309 4/20 0.32
CHRM4 P08173 1/20 0.32
CHRM5 P08912 1/20 0.32
MAPT P10636 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
HSD17B10 Q99714 1/20 0.31
POLB P06746 1/20 0.31
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL546498 0.91 POLB (0.31) MAPTPOLB
SCHEMBL546826 0.90 TDP1 (0.39) KMT2AHTTMEN1TSHRCHRM2
SCHEMBL2183095 0.90 TDP1 (0.39) KMT2AHTTMEN1TSHRCHRM2
SCHEMBL547443 0.90 TDP1 (0.39) KMT2AHTTMEN1TSHRCHRM2
SCHEMBL546870 0.90 TDP1 (0.39) KMT2AHTTMEN1TSHRCHRM2
SCHEMBL546330 0.90 TDP1 (0.39) KMT2AHTTMEN1TSHRCHRM2
SCHEMBL546301 0.90 TDP1 (0.39) KMT2AHTTMEN1TSHRCHRM2
SCHEMBL1634221 0.88 KMT2A (0.34) KMT2AHTTMEN1TSHRCHRM2
SCHEMBL546350 0.85 TDP1 (0.35) KMT2ATDP1
SCHEMBL547199 0.85 TDP1 (0.35) KMT2ATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed