⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL419053 | 0.79 | — | — | |
| SCHEMBL17410224 | 0.76 | CYP3A4 (0.41) | — | |
| SCHEMBL24608421 | 0.75 | — | — | |
| SCHEMBL14763940 | 0.75 | — | — | |
| SCHEMBL4777005 | 0.75 | NR1H2 (0.32) | — | |
| SCHEMBL8866039 | 0.75 | MMP2 (0.31) | — | |
| SCHEMBL12694277 | 0.73 | NPC1 (0.38) | — | |
| SCHEMBL5929603 | 0.73 | CYP2C19 (0.44) | — | |
| SCHEMBL9402279 | 0.73 | HCAR2 (0.37) | — | |
| SCHEMBL24796706 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 167 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-12-26 | — | — | US | disclosed |
| US-20230293522-A1 | HETEROARYL COMPOUNDS USEFUL AS INHIBITORS OF SUMO ACTIVATING ENZYME | TAKEDA PHARMACEUTICAL COMPANY LIMITED (JP) | 2023-09-21 | — | — | US | disclosed |
| US-20230293522-A1 | HETEROARYL COMPOUNDS USEFUL AS INHIBITORS OF SUMO ACTIVATING ENZYME | TAKEDA PHARMACEUTICAL COMPANY LIMITED (JP) | 2023-09-21 | — | — | US | disclosed |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-02-07 | — | — | US | disclosed |
| WO-2022237781-A1 | AMIDE DERIVATIVE AND APPLICATION THEREOF | 成都百裕制药股份有限公司 | 2022-11-17 | — | — | WO | disclosed |
| US-20220106289-A1 | NLRP3 INHIBITORS | INFLAZOME LIMITED (IE) | 2022-04-07 | — | — | US | disclosed |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-02-08 | — | — | US | disclosed |
| EP-3062151-B1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-05-05 | — | — | EP | disclosed |
| EP-3517112-B1 | HETEROARYL COMPOUNDS USEFUL AS INHIBITORS OF SUMO ACTIVATING ENZYME | MILLENNIUM PHARM INC (US) | 2021-04-07 | — | — | EP | disclosed |
| EP-3141957-B1 | RESIST MATERIAL, RESIST COMPOSITION, AND RESIST PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-03-24 | — | — | EP | disclosed |
| US-20030022095-A1 | Negative type radiation sensitive resin composition | JSR CORPORATION (JP) | 2003-01-30 | — | — | US | disclosed |
| EP-1270565-A1 | 4-Substituted furan-2-sulfonamide and its use in the preparation of sulfonyl urea derivatives | PFIZER INC. (US) | 2003-01-02 | — | — | EP | disclosed |
| EP-1270554-A1 | Sulfonyl urea derivatives and their use in the control of interleukin-1 activity | PFIZER INC. (US) | 2003-01-02 | — | — | EP | disclosed |
| US-6433009-B1 | TREATMENT OF AUTOIMMUNE, CARDIOVASCULAR, NERVOUS SYSTEM, GASTROINTESTINAL, RESPIRATORY SYSTEM, AND VIRAL DISORDERS; ANTIDIABETIC, ANTIARTHRITIC, ANTIINFLAMMATORY AND ANTIDEPRESSANT AGENTS | PFIZER INC | 2002-08-13 | — | — | US | disclosed |
| EP-1214087-A1 | COMBINATION TREATMENT WITH IL-1RA AND COMPOUNDS THAT INHIBIT IL-1 PROCESSING AND RELEASE | Pfizer Products Inc. (US) | 2002-06-19 | — | — | EP | disclosed |
| WO-2001019390-A1 | COMBINATION TREATMENT WITH IL-1RA AND DIARYL SULPHONYL UREA COMPOUNDS | PFIZER PRODUCTS INC. (US) | 2001-03-22 | — | — | WO | disclosed |
| CN-1284064-A | 2,3-substituted indole compounds as cox-2 inhibitors | PFIZER PHARMA (US) | 2001-02-14 | — | — | CN | disclosed |
| US-6166064-A | Sulfonyl urea derivatives and their use in the control of interleukin-1 activity | PFIZER INC (US) | 2000-12-26 | — | — | US | disclosed |
| EP-1045833-A1 | 2,3-SUBSTITUTED INDOLE COMPOUNDS AS COX-2 INHIBITORS | PFIZER INC. (US) | 2000-10-25 | — | — | EP | disclosed |
| WO-1999035130-A1 | 2,3-SUBSTITUTED INDOLE COMPOUNDS AS COX-2 INHIBITORS | PFIZER PHARMACEUTICALS INC. (JP) | 1999-07-15 | — | — | WO | disclosed |