SCHEMBL5478947

SCHEMBL5478947

CC(O)CNO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL11780855 0.97
Diisopropanolamine SCHEMBL22774 0.74
SCHEMBL464755 0.74
Diisopropanolamine SCHEMBL10618901 0.74
SCHEMBL21837345 0.73
SCHEMBL879230 0.71
SCHEMBL152642 0.71
Diisopropanolamine SCHEMBL3362609 0.71 ALDH1A1 (0.43)
Diisopropanolamine SCHEMBL6858463 0.71 TSHR (0.41)
SCHEMBL879244 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4602020-A1 ANTIPOLYMERANT COMPOSITIONS WITH NAPHTHOQUINONE AND HYDROXYLAMINE AND METHODS OF USING Ecolab USA, Inc. (US) 2025-08-20 EP claimed
US-20240141131-A1 ANTIPOLYMERANT COMPOSITIONS WITH NAPHTHOQUINONE AND HYDROXYLAMINE AND METHODS OF USING ECOLAB USA INC. 2024-05-02 US claimed
WO-2024081354-A1 ANTIPOLYMERANT COMPOSITIONS WITH NAPHTHOQUINONE AND HYDROXYLAMINE AND METHODS OF USING ECOLAB USA INC. (US) 2024-04-18 WO claimed
CN-114787325-A Method for minimizing fouling, corrosion and solvent degradation in low temperature oil refineries and natural gas processing BL 科技公司 2022-07-22 CN claimed
EP-3037511-B1 SEMI-AQUEOUS PHOTORESIST OR SEMICONDUCTOR MANUFACTURING RESIDUE STRIPPING AND CLEANING COMPOSITION WITH IMPROVED SILICON PASSIVATION VERSUM MAT US LLC (US) 2022-07-06 EP claimed
CN-105717756-A SEMI-AQUEOUS PHOTORESIST OR SEMICONDUCTOR MANUFACTURING RESIDUE STRIPPING AND CLEANING COMPOSITION WITH IMPROVED SILICON PASSIVATION 气体产品与化学公司 2016-06-29 CN claimed
US-20160179011-A1 Semi-Aqueous Photoresist or Semiconductor Manufacturing Residue Stripping and Cleaning Composition with Improved Silicon Passivation AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-06-23 US claimed
US-20070166341-A1 Solid volatile composition and method and system for making the same INTERNATIONAL ARTS & SCIENCE GROUP, INC. 2007-07-19 US claimed
EP-4602020-A1 ANTIPOLYMERANT COMPOSITIONS WITH NAPHTHOQUINONE AND HYDROXYLAMINE AND METHODS OF USING Ecolab USA, Inc. (US) 2025-08-20 EP disclosed
US-20240209234-A1 NON-SPHERICAL PRIMARY SILICA NANOPARTICLES AND THE USE THEREFOR VERSUM MATERIALS US, LLC 2024-06-27 US disclosed
US-20240141131-A1 ANTIPOLYMERANT COMPOSITIONS WITH NAPHTHOQUINONE AND HYDROXYLAMINE AND METHODS OF USING ECOLAB USA INC. 2024-05-02 US disclosed
WO-2024081354-A1 ANTIPOLYMERANT COMPOSITIONS WITH NAPHTHOQUINONE AND HYDROXYLAMINE AND METHODS OF USING ECOLAB USA INC. (US) 2024-04-18 WO disclosed
EP-4326678-A1 NON-SPHERICAL PRIMARY SILICA NANOPARTICLES AND THE USE THEREFOR Versum Materials US, LLC (US) 2024-02-28 EP disclosed
CN-115516073-A Cleaning agent composition and chemical mechanical polishing composition 株式会社大赛璐 2022-12-23 CN disclosed
CN-1451672-A Polyurethane dispersion based on fatty acid dialkyl alochol amide BAYER AG (DE) 2003-10-29 CN disclosed
US-20030191273-A1 Polyurethane dispersions based on fatty acid dialkanolamides COVESTRO DEUTSCHLAND AG (DE) 2003-10-09 US disclosed
WO-1998002403-A1 METHOD FOR INHIBITING VINYL AROMATIC MONOMER POLYMERIZATION IN CONDENSER AND COMPRESSION SYSTEMS BETZDEARBORN INC. (US) 1998-01-22 WO disclosed
US-5396004-A Diamine, hydroxylamine BETZ LABORATORIES, INC. (US) 1995-03-07 US disclosed
EP-0594341-A1 Compositions and methods for inhibiting vinyl aromatic monomer polymerization BETZ EUROPE, INC. (US) 1994-04-27 EP disclosed
US-4192937-A Process for the preparation of isocyanate polyaddition products which have hydroxyl groups in side chains BAYER AKTIENGESELLSCHAFT (DE) 1980-03-11 US disclosed