⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1426674 | 0.74 | — | — | |
| SCHEMBL15583366 | 0.70 | — | — | |
| SCHEMBL19287370 | 0.70 | — | — | |
| SCHEMBL13496581 | 0.69 | — | — | |
| SCHEMBL14527700 | 0.67 | — | — | |
| SCHEMBL14216728 | 0.66 | ALDH1A1 (0.31) | — | |
| SCHEMBL13837592 | 0.66 | ALDH1A1 (0.31) | — | |
| SCHEMBL19406248 | 0.64 | — | — | |
| SCHEMBL20846379 | 0.64 | ALDH1A1 (0.44) | — | |
| SCHEMBL452003 | 0.64 | HCAR2 (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023088869-A2 | COMPOSITIONS AND METHODS FOR IMPROVING METAL STRUCTURE FABRICATION BY WET CHEMICAL ETCH | MERCK PATENT GMBH (DE) | 2023-05-25 | — | — | WO | claimed |
| US-6303264-B1 | PROFILE OF PATTERN OF QUARTER MICRON ORDER WITHOUT CAUSING FOOTING, WHILE RETAINING HIGH RESOLUTION ABILITY AND HIGH SENSITIVITY | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 2001-10-16 | — | — | US | claimed |
| EP-0195986-B1 | HIGH CONTRAST, HIGH RESOLUTION DEEP ULTRAVIOLET LITHOGRAPHIC RESISTS | International Business Machines Corporation (US) | 1989-03-08 | — | — | EP | claimed |
| JP-57102906-A | — | — | None | — | — | JP | disclosed |
| WO-2025079509-A1 | COMPOUND, COMPOSITION, CURED PRODUCT, AND METHOD FOR PRODUCING CURED PRODUCT | 株式会社ADEKA | 2025-04-17 | — | — | WO | disclosed |
| WO-2023088869-A2 | COMPOSITIONS AND METHODS FOR IMPROVING METAL STRUCTURE FABRICATION BY WET CHEMICAL ETCH | MERCK PATENT GMBH (DE) | 2023-05-25 | — | — | WO | disclosed |
| CN-115667327-A | Recycled styrene monomer, styrene resin, styrene- (meth) acrylic copolymer, polymer alloy, composition, sheet, film, laminate, molded body, and method for producing polymer | DIC株式会社 | 2023-01-31 | — | — | CN | disclosed |
| CN-115516016-A | Regeneration method of waste polystyrene product | DIC株式会社 | 2022-12-23 | — | — | CN | disclosed |
| US-11385183-B2 | Method for detecting copper(II) ions using a hydrazone-based colorimetric sensor | KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS (SA) | 2022-07-12 | — | — | US | disclosed |
| US-11008420-B2 | Resin composition, prepreg, metal foil-clad laminate, resin composite sheet, and printed wiring board | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-05-18 | — | — | US | disclosed |
| US-20210109027-A1 | METHOD FOR DETECTING COPPER(II) IONS USING A HYDRAZONE-BASED COLORIMETRIC SENSOR | KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS (SA) | 2021-04-15 | — | — | US | disclosed |
| CN-1671810-A | Sprayable compositions | HUNTSMAN ADV MAT SWITZERLAND (CH) | 2005-09-21 | — | — | CN | disclosed |
| US-20040229156-A1 | Photosensitive composition and planographic printing plate using the same | FUJI PHOTO FILM CO,. LTD. (JP) | 2004-11-18 | — | — | US | disclosed |
| EP-1093934-B1 | Photosensitive composition and planographic printing plate using the same | FUJI PHOTO FILM CO LTD (JP) | 2004-02-11 | — | — | EP | disclosed |
| EP-1382460-A1 | Photosensitive composition and planographic printing plate using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2004-01-21 | — | — | EP | disclosed |
| US-6534250-B1 | Functionalized derivatives of benzocyclobutenone are photoreactive and may be employed in the production of a variety of self-curable polymer composition which may be employed as photoresist compositions | CARLETON UNIVERSITY (CA) | 2003-03-18 | — | — | US | disclosed |
| EP-1093934-A1 | Photosensitive composition and planographic printing plate using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2001-04-25 | — | — | EP | disclosed |
| EP-0489550-B1 | Process for the preparation of 4-hydroxystyrene polymers from 4-acetoxystyrene polymers | HOECHST CELANESE CORP (US) | 1995-06-21 | — | — | EP | disclosed |
| EP-0489550-A1 | Process for the preparation of 4-hydroxystyrene polymers from 4-acetoxystyrene polymers | HOECHST CELANESE CORPORATION (US) | 1992-06-10 | — | — | EP | disclosed |
| JP-S57102906-A | PRODUCTION OF CROSSLINKED AMINOMETHYLATED POLY-M- HYDROXYSTYRENE POLYELECTROLYTE | COSMO CO LTD | 1982-06-26 | — | — | JP | disclosed |