⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2293900 | 0.97 | — | — | |
| SCHEMBL129902 | 0.90 | — | — | |
| SCHEMBL127204 | 0.83 | — | — | |
| SCHEMBL2664511 | 0.79 | ALDH1A1 (0.32) | — | |
| SCHEMBL31303606 | 0.79 | ALDH1A1 (0.32) | — | |
| SCHEMBL31303660 | 0.79 | ALDH1A1 (0.32) | — | |
| SCHEMBL31303647 | 0.79 | ALDH1A1 (0.32) | — | |
| SCHEMBL31303625 | 0.75 | — | — | |
| SCHEMBL25026105 | 0.73 | ALDH1A1 (0.36) | — | |
| SCHEMBL21338912 | 0.73 | ALDH1A1 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9453944-B2 | Polymerizable amido-containing organosilicon compounds, silicon-containing polymers and biomedical devices therefrom | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2016-09-27 | — | — | US | claimed |
| CN-108008600-B | Radiation-sensitive composition | 三菱瓦斯化学株式会社 | 2021-02-09 | — | — | CN | disclosed |
| EP-2080750-B1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-07-29 | — | — | EP | disclosed |
| US-9897913-B2 | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-02-20 | — | — | US | disclosed |
| US-9487612-B2 | (Meth)acryloxy-containing trisiloxane, siloxane-containing polymers and biomedical devices therefrom | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2016-11-08 | — | — | US | disclosed |
| US-20150368386-A1 | (METH)ACRYLOXY-CONTAINING TRISILOXANE, SILOXANE-CONTAINING POLYMERS AND BIOMEDICAL DEVICES THEREFROM | MOMENTIVE PERFORMANCE MATERIALS INC. | 2015-12-24 | — | — | US | disclosed |
| EP-2953955-A1 | (METH)ACRYLOXY-CONTAINING TRISILOXANE, SILOXANE-CONTAINING POLYMERS AND BIOMEDICAL DEVICES THEREFROM | Momentive Performance Materials Inc. (US) | 2015-12-16 | — | — | EP | disclosed |
| US-20150030980-A1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2015-01-29 | — | — | US | disclosed |
| US-8846292-B2 | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-09-30 | — | — | US | disclosed |
| WO-2014123959-A1 | OXYGEN PERMEABLE HYDROUS CONTACT LENS AND COMPOSITION THEREFOR | SEED CO., LTD. (JP) | 2014-08-14 | — | — | WO | disclosed |
| US-20100016319-A1 | ARYLMETHYLENE UREA DERIVATIVE AND USE THEREOF | TORAY INDUSTRIES, INC. A CORPORATION OF JAPAN (JP) | 2010-01-21 | — | — | US | disclosed |
| EP-2143709-A1 | AMIDE COMPOUND AND USE THEREOF | Sumitomo Chemical Company, Limited (JP) | 2010-01-13 | — | — | EP | disclosed |
| EP-2080750-A1 | RADIATION-SENSITIVE COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2009-07-22 | — | — | EP | disclosed |
| US-20090131531-A1 | Amide Compounds and their Use | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-05-21 | — | — | US | disclosed |
| CN-101351442-A | Amide compound and use thereof | SUMITOMO CHEMICAL CO (JP) | 2009-01-21 | — | — | CN | disclosed |
| CN-100436406-C | Process for producing optically active bisamidoalcohol compound | SUMITOMO CHEMICAL CO (JP) | 2008-11-26 | — | — | CN | disclosed |
| EP-1970375-A1 | ARYLMETHYLENE UREA DERIVATIVE AND USE THEREOF | TORAY INDUSTRIES, INC. (JP) | 2008-09-17 | — | — | EP | disclosed |
| EP-1940780-A1 | AMIDE COMPOUNDS AND THEIR USE | SUMITOMO CHEMICAL CO., LTD. (JP) | 2008-07-09 | — | — | EP | disclosed |
| WO-2007049728-A1 | AMIDE COMPOUNDS AND THEIR USE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-05-03 | — | — | WO | disclosed |
| CN-1898193-A | Method for producing optically active bisamidealcohol compound | SUMITOMO CHEMICAL CO (JP) | 2007-01-17 | — | — | CN | disclosed |