Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 5/20 | 0.57 |
| ▸ | CA2 | P00918 | 5/20 | 0.57 |
| ▸ | CA12 | O43570 | 2/20 | 0.57 |
| ▸ | CA7 | P43166 | 2/20 | 0.57 |
| ▸ | CA9 | Q16790 | 2/20 | 0.57 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.57 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.57 |
| ▸ | MAPT | P10636 | 3/20 | 0.57 |
| ▸ | TSHR | P16473 | 1/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.52 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.50 |
| ▸ | LOXL2 | Q9Y4K0 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 1/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.48 |
| ▸ | RAB9A | P51151 | 4/20 | 0.47 |
| ▸ | NPC1 | O15118 | 2/20 | 0.47 |
| ▸ | ATM | Q13315 | 1/20 | 0.47 |
| ▸ | CASP3 | P42574 | 1/20 | 0.47 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.47 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23081133 | 0.87 | MAPT (0.45) | CA1CA2CA12CA7CA9 | |
| SCHEMBL592406 | 0.85 | CA1 (0.68) | CA1CA2CA12CA7CA9 | |
| SCHEMBL2890249 | 0.85 | CA1 (0.59) | CA1CA2CA12CA7CA9 | |
| SCHEMBL677961 | 0.85 | CA1 (0.59) | CA1CA2CA12CA7CA9 | |
| SCHEMBL18388586 | 0.84 | CA1 (0.53) | CA1CA2CA12CA7CA9 | |
| Water SCHEMBL28249729 | 0.83 | CA1 (0.66) | CA1CA2CA12CA7CA9 | |
| SCHEMBL15382437 | 0.83 | CA1 (0.57) | CA1CA2CA12CA7CA9 | |
| SCHEMBL4309604 | 0.82 | CA1 (0.52) | CA1CA2CA12CA7CA9 | |
| SCHEMBL4505223 | 0.82 | TSHR (0.53) | CA1CA2CA12CA7CA9 | |
| SCHEMBL23600 | 0.82 | CA1 (0.80) | CA1CA2CA12CA7CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 121 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-12-26 | — | — | US | disclosed |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-02-07 | — | — | US | disclosed |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-02-08 | — | — | US | disclosed |
| EP-3062151-B1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-05-05 | — | — | EP | disclosed |
| EP-3141957-B1 | RESIST MATERIAL, RESIST COMPOSITION, AND RESIST PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-03-24 | — | — | EP | disclosed |
| EP-3279728-B1 | RESIST BASE MATERIAL, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-03-17 | — | — | EP | disclosed |
| US-20210070748-A1 | INHIBITORS OF BRUTONS TYROSINE KINASE | PHARMACYCLICS LLC (US) | 2021-03-11 | — | — | US | disclosed |
| US-20200409261-A1 | COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, METHOD FOR PRODUCING AMORPHOUS FILM, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR FORMING CIRCUIT PATTERN, AND PURIFICATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-12-31 | — | — | US | disclosed |
| US-10851072-B2 | Inhibitors of Rho/MRTF/SRF-mediated gene transcription and methods for use of the same | THE REGENTS OF THE UNIVERSITY OF MICHIGAN (US) | 2020-12-01 | — | — | US | disclosed |
| US-10851072-B2 | Inhibitors of Rho/MRTF/SRF-mediated gene transcription and methods for use of the same | THE REGENTS OF THE UNIVERSITY OF MICHIGAN (US) | 2020-12-01 | — | — | US | disclosed |
| EP-1014962-A4 | ANTITHROMBOTIC AGENTS | LILLY CO ELI (US) | 2007-06-27 | — | — | EP | disclosed |
| EP-1776338-A1 | INDOLE, INDAZOLE OR INDOLINE DERIVATIVES | F. Hoffmann-Roche AG (CH) | 2007-04-25 | — | — | EP | disclosed |
| US-20060030613-A1 | Indole, indazole and indoline derivatives as CETP inhibitors | F. HOFFMANN-LA ROCHE AG (CH) | 2006-02-09 | — | — | US | disclosed |
| WO-2006013048-A1 | INDOLE, INDAZOLE OR INDOLINE DERIVATIVES | F.HOFFMANN-LA ROCHE AG (CH) | 2006-02-09 | — | — | WO | disclosed |
| US-6605626-B2 | Benzamide inhibitors of factor Xa | ELI LILLY AND COMPANY | 2003-08-12 | — | — | US | disclosed |
| US-20030022095-A1 | Negative type radiation sensitive resin composition | JSR CORPORATION (JP) | 2003-01-30 | — | — | US | disclosed |
| US-20020120007-A1 | Benzamide inhibitors of factor Xa | BEIGHT DOUGLAS WADE (US) | 2002-08-29 | — | — | US | disclosed |
| US-6313122-B1 | AS INHIBITORS OF FACTOR XA AND ARE USED AS ANTICOAGULANTS IN MAMMALS | ELI LILLY AND COMPANY | 2001-11-06 | — | — | US | disclosed |
| EP-1014962-A1 | ANTITHROMBOTIC AGENTS | ELI LILLY AND COMPANY (US) | 2000-07-05 | — | — | EP | disclosed |
| WO-1999000121-A1 | ANTITHROMBOTIC AGENTS | ELI LILLY AND COMPANY (US) | 1999-01-07 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20060030613-A1 | Indole, indazole and indoline derivatives as CETP inhibitors | CETP, NAT1, MTTP | CA1 4376/4885CA2 2610/4885CA12 4192/4885 |
| US-20210070748-A1 | INHIBITORS OF BRUTONS TYROSINE KINASE | BTK, LYN, LCK | CA1 4698/4885CA2 3446/4885CA12 4752/4885 |
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | SLC39A11, CROCC, TERB1 | CA1 1120/4885CA2 3332/4885CA12 2546/4885 |
| US-20200409261-A1 | COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, METHOD FOR PRODUCING AMORPHOUS FILM, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR FORMING CIRCUIT PATTERN, AND PURIFICATION METHOD | C9, C1R, RAD51 | CA1 131/4885CA2 1077/4885CA12 1263/4885 |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | CA1 161/4885CA2 1466/4885CA12 1606/4885 |
| US-20020120007-A1 | Benzamide inhibitors of factor Xa | TFPI, F11, F12 | CA1 1970/4885CA2 1937/4885CA12 1735/4885 |
| US-10851072-B2 | Inhibitors of Rho/MRTF/SRF-mediated gene transcription and methods for use of the same | RHOXF2, BPTF, SREBF1 | CA1 4885/4885CA2 4615/4885CA12 4877/4885 |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | CA1 161/4885CA2 1466/4885CA12 1606/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.