SCHEMBL548642

SCHEMBL548642

CC(C)(O)c1ccccc1O

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.68
TDP1 Q9NUW8 3/20 0.68
TSHR P16473 3/20 0.68
CA2 P00918 5/20 0.45
ALOX15 P16050 5/20 0.45
LMNA P02545 4/20 0.45
HSD17B10 Q99714 3/20 0.45
CYP3A4 P08684 3/20 0.45
KDM4E B2RXH2 3/20 0.45
MAPT P10636 3/20 0.45
SMN1; SMN2 Q16637 3/20 0.45
EGFR P00533 2/20 0.45
FYN P06241 2/20 0.45
MMP9 P14780 2/20 0.45
HPGD P15428 2/20 0.45
RECQL P46063 2/20 0.45
NPC1 O15118 2/20 0.45
CA4 P22748 2/20 0.45
CA12 O43570 1/20 0.45
GMNN O75496 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30368089 1.00 ALDH1A1 (0.68) ALDH1A1TDP1TSHRCA2ALOX15
SCHEMBL9327128 0.86 ALDH1A1 (0.71) ALDH1A1TDP1TSHRCA2ALOX15
SCHEMBL28056463 0.84 ALDH1A1 (0.68) ALDH1A1TDP1TSHRCA2ALOX15
Benzoic Acid SCHEMBL27652235 0.84 TSHR (0.52) ALDH1A1TDP1TSHRCA2CYP3A4
SCHEMBL29506834 0.83 ALDH1A1 (0.50) ALDH1A1TDP1TSHRCA2ALOX15
SCHEMBL2059781 0.83 ALDH1A1 (0.50) ALDH1A1TDP1TSHRCA2ALOX15
Tert-Butanol SCHEMBL27621850 0.82 ALDH1A1 (0.90) ALDH1A1TDP1TSHRCA2ALOX15
SCHEMBL11796471 0.82 ALDH1A1 (0.65) ALDH1A1TDP1TSHRCA2ALOX15
SCHEMBL11813237 0.81 ALDH1A1 (0.52) ALDH1A1TDP1TSHRCA2ALOX15
SCHEMBL584830 0.81 ALDH1A1 (0.71) ALDH1A1TDP1TSHRCA2ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 208 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119859118-A Synthesis method of 4- (2-hydroxy-2-propyl) cumene hydroperoxide 中国石油化工股份有限公司 2025-04-22 CN disclosed
US-11852970-B2 Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-12-26 US disclosed
CN-110531580-B Chemically amplified negative resist composition and resist pattern forming method 信越化学工业株式会社 2023-08-29 CN disclosed
EP-3964509-B1 COMPOUND CONTAINING FUSED RING, USE THEREOF AND PHARMACEUTICAL COMPOSITION CONTAINING SAME NANJING HEPO PHARMACEUTICAL CO LTD (CN) 2023-06-14 EP disclosed
US-11661420-B2 Compound containing fused ring, use thereof and pharmaceutical composition containing same NANJING HEPO PHARMACEUTICAL CO., LTD (CN) 2023-05-30 US disclosed
US-11661420-B2 Compound containing fused ring, use thereof and pharmaceutical composition containing same NANJING HEPO PHARMACEUTICAL CO., LTD (CN) 2023-05-30 US disclosed
US-11572430-B2 Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-02-07 US disclosed
CN-110526802-B Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming method 信越化学工业株式会社 2022-09-20 CN disclosed
US-20220213085-A1 COMPOUND CONTAINING FUSED RING, USE THEREOF AND PHARMACEUTICAL COMPOSITION CONTAINING SAME NANJING HEPO PHARMACEUTICAL CO., LTD (CN) 2022-07-07 US disclosed
US-11243467-B2 Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-02-08 US disclosed
US-5374629-A A triene steroids as anticarcinogenic agents, treating skin disorders LEO PHARMACEUTICAL PRODUCTS LTD. A/S LOVENS KEMISKE FABRIK PRODUKTIONSAKTIESELSKAB (DK) 1994-12-20 US disclosed
EP-0522013-B1 NOVEL VITAMIN D ANALOGUES LEO PHARM PROD LTD (DK) 1994-11-23 EP disclosed
EP-0522013-A1 NOVEL VITAMIN D ANALOGUES. LEO PHARM PROD LTD (DK) 1993-01-13 EP disclosed
WO-1991015475-A1 NOVEL VITAMIN D ANALOGUES Leo Pharmaceutical Products Ltd. A/S (Løvens Kemiske Fabrik Produktionsaktieselskab) (DK) 1991-10-17 WO disclosed
US-4978789-A CATALYTIC DEHYDROGENATION USING A MIXED OXIDE CONTAINING IRON AND SILICON; DEALKENYLATION OF ALKYL PHENOLS AND ANILINES MITSUI CHEMICALS, INC. (JP) 1990-12-18 US disclosed
EP-0205317-B1 PROCESS FOR PRODUCTION OF ALKENYL SUBSTITUTED AROMATIC COMPOUND MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1988-12-14 EP disclosed
EP-0205317-A1 Process for production of alkenyl substituted aromatic compound MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1986-12-17 EP disclosed
US-4258219-A Process for producing hydroquinone MITSUI TOATSU CHEMICALS, INC. (JP) 1981-03-24 US disclosed
US-4230890-A PRECIPITATION BY TREATING AN ORGANIC SOLUTION OF HYDROCARBON OXIDATES WITH AN ALKALI METAL HYDROXIDE THE GOODYEAR TIRE & RUBBER COMPANY (US) 1980-10-28 US disclosed
US-3969420-A Process for recovering resorcinol and hydroquinone in mixture SUMITOMO CHEMICAL COMPANY, LIMITED (JA) 1976-07-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11852970-B2 Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin SLC39A11, CROCC, TERB1 ALDH1A1 3830/4885TDP1 2867/4885TSHR 2912/4885
US-11572430-B2 Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method C9, C5, C1R ALDH1A1 1540/4885TDP1 3114/4885TSHR 1292/4885
US-11243467-B2 Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method C9, C5, C1R ALDH1A1 1540/4885TDP1 3114/4885TSHR 1292/4885
US-20220213085-A1 COMPOUND CONTAINING FUSED RING, USE THEREOF AND PHARMACEUTICAL COMPOSITION CONTAINING SAME HLA-B, HLA-A, SLC10A1 ALDH1A1 2801/4885TDP1 3430/4885TSHR 3525/4885
US-11661420-B2 Compound containing fused ring, use thereof and pharmaceutical composition containing same HLA-B, HLA-A, SLC10A1 ALDH1A1 2801/4885TDP1 3430/4885TSHR 3525/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.