⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29548159 | 0.78 | — | — | |
| SCHEMBL5079516 | 0.71 | — | — | |
| SCHEMBL2270442 | 0.67 | — | — | |
| SCHEMBL3679737 | 0.67 | — | — | |
| SCHEMBL6273786 | 0.60 | — | — | |
| SCHEMBL5085534 | 0.59 | — | — | |
| SCHEMBL18526898 | 0.58 | — | — | |
| SCHEMBL5486595 | 0.57 | — | — | |
| Butadiene SCHEMBL2499295 | 0.56 | — | — | |
| SCHEMBL2271529 | 0.55 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240117192-A1 | METHOD FOR MANUFACTURING SURFACE-TREATED GAS-PHASE-PROCESS SILICA PARTICLE, SURFACE-TREATED GAS-PHASE-PROCESS SILICA PARTICLE, AND TONER EXTERNAL ADDITIVE FOR ELECTROSTATIC CHARGE IMAGE DEVELOPMENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-04-11 | — | — | US | disclosed |
| EP-4296228-A1 | METHOD FOR MANUFACTURING SURFACE-TREATED VAPOR PHASE SILICA PARTICLES, SURFACE-TREATED VAPOR PHASE SILICA PARTICLES, AND EXTERNAL ADDITIVE FOR TONER FOR ELECTROSTATIC CHARGE IMAGE DEVELOPMENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-27 | — | — | EP | disclosed |
| CN-116888072-A | Method for producing surface-treated fumed silica particles, and toner external additive for developing electrostatic images | 信越化学工业株式会社 | 2023-10-13 | — | — | CN | disclosed |
| WO-2020045827-A1 | SILICONE RUBBER SPONGE COMPOSITION | 주식회사 케이씨씨 | 2020-03-05 | — | — | WO | disclosed |
| CN-109705351-A | Dendritic polysiloxanes and preparation method thereof and add-on type liquid organosilicon flat sealant and preparation method thereof | 广州市白云化工实业有限公司 | 2019-05-03 | — | — | CN | disclosed |
| CN-109642080-A | ADDITION-CURABLE SILICONE RUBBER COMPOSITION AND AIRBAG | 信越化学工业株式会社 | 2019-04-16 | — | — | CN | disclosed |
| CN-104245132-B | High activated catalyst and its preparation method for hydrosilylation reactions | 莫门蒂夫性能材料股份有限公司 | 2017-09-22 | — | — | CN | disclosed |
| EP-2744634-A1 | IRRADIATING AND MOLDING UNIT | Momentive Performance Materials GmbH (DE) | 2014-06-25 | — | — | EP | disclosed |
| WO-2013024146-A1 | IRRADIATING AND MOLDING UNIT | MOMENTIVE PERFORMANCE MATERIALS GMBH (DE) | 2013-02-21 | — | — | WO | disclosed |
| EP-1817372-A1 | USE OF LIGHT-ACTIVATED HARDENABLE SILICON COMPOSITIONS FOR THE PRODUCTION OF THICK-WALLED MOULDED ARTICLES OR THICK-WALLED COATINGS | Momentive Performance Materials GmbH & Co. KG (DE) | 2007-08-15 | — | — | EP | disclosed |
| EP-1697985-A1 | COMBINATIONS OF RESIN COMPOSITIONS AND METHODS OF USE THEREOF | GENERAL ELECTRIC COMPANY (US) | 2006-09-06 | — | — | EP | disclosed |
| WO-2006010763-A1 | USE OF LIGHT-ACTIVATED HARDENABLE SILICON COMPOSITIONS FOR THE PRODUCTION OF THICK-WALLED MOULDED ARTICLES OR THICK-WALLED COATINGS | GE BAYER SILICONES GMBH & CO. KG (DE) | 2006-02-02 | — | — | WO | disclosed |
| WO-2005062369-A1 | COMBINATIONS OF RESIN COMPOSITIONS AND METHODS OF USE THEREOF | GENERAL ELECTRIC COMPANY (US) | 2005-07-07 | — | — | WO | disclosed |