Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 4/20 | 0.82 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.82 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.50 |
| ▸ | THRB | P10828 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 3/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | USP2 | O75604 | 1/20 | 0.35 |
| ▸ | OR51E2 | Q9H255 | 1/20 | 0.32 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | AGTR1 | P30556 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Glycerin SCHEMBL757035 | 1.00 | — | — | |
| Glycerin SCHEMBL3262492 | 1.00 | LMNA (0.82) | LMNAALDH1A1TDP1THRBTSHR | |
| Glycerin SCHEMBL28435946 | 0.96 | — | — | |
| Glycerin SCHEMBL8991622 | 0.96 | — | — | |
| Glycerin SCHEMBL10432780 | 0.96 | — | — | |
| Glycerin SCHEMBL9742374 | 0.96 | — | — | |
| Glycerin SCHEMBL23630291 | 0.92 | LMNA (0.69) | LMNAALDH1A1TDP1THRBTSHR | |
| Glycerin SCHEMBL11133353 | 0.92 | LMNA (0.69) | LMNAALDH1A1TDP1THRBTSHR | |
| Glycerin SCHEMBL27697354 | 0.91 | — | — | |
| Glycerin SCHEMBL28212896 | 0.91 | LMNA (0.82) | LMNAALDH1A1TDP1THRBTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1431032-B1 | Polymerizable composition and lithographic printing plate precursor | FUJIFILM CORP (JP) | 2015-12-09 | — | — | EP | disclosed |
| US-8110337-B2 | Mixture of binder, an unsaturated compound and acid generator; lithography | FUJIFILM CORPORATION (JP) | 2012-02-07 | — | — | US | disclosed |
| US-7569328-B2 | Resin composition and thermo/photosensitive composition | FUJIFILM CORPORATION (JP) | 2009-08-04 | — | — | US | disclosed |
| US-7351773-B2 | Polymerizable composition | FUJIFILM CORPORATION (JP) | 2008-04-01 | — | — | US | disclosed |
| US-20080044763-A1 | Resin composition and thermo/photosensitive composition | FUJIFILM CORPORATION | 2008-02-21 | — | — | US | disclosed |
| US-20060040211-A1 | Method of manufacturing light sensitive planographic printing plates and method of using the same | KONICA MINOLTA MEDICAL & GRAPHIC, INC. | 2006-02-23 | — | — | US | disclosed |
| US-20050023508-A1 | Lithographic printing plate precursor; computer infrared laser development; storage stability, printing durability; water soluble or swellable polyamide or polyester containing unsaturated fuctionality, radically polymerizable compound, initiator and absorber | FUJI PHOTO FILM CO., LTD. | 2005-02-03 | — | — | US | disclosed |
| US-20040234893-A9 | Resin composition and thermo/photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2004-11-25 | — | — | US | disclosed |
| US-20040137369-A1 | Polymerizable composition and lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. | 2004-07-15 | — | — | US | disclosed |
| US-20040131972-A1 | Resin composition and thermo/photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2004-07-08 | — | — | US | disclosed |
| EP-1431032-A1 | Polymerizable composition and lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2004-06-23 | — | — | EP | disclosed |
| EP-1389521-A2 | Thermosensitive/photosensitive resin composition | Fuji Photo Film Co., Ltd. (JP) | 2004-02-18 | — | — | EP | disclosed |
| US-20040009426-A1 | Photopolymerizable monomers hardenable by an infrared exposure; electrostatic capacitance rate of increased ratio of such photosensitive formulation, is no more than 0.7 | FUJI PHOTO FILM CO., LTD. | 2004-01-15 | — | — | US | disclosed |
| EP-1369231-A2 | Infrared photosensitive composition and image recording material for infrared exposure | FUJI PHOTO FILM CO., LTD. (JP) | 2003-12-10 | — | — | EP | disclosed |
| US-6660446-B2 | Generating acid upon heating | FUJI PHOTO FILM CO., LTD. (JP) | 2003-12-09 | — | — | US | disclosed |
| US-20020025489-A1 | Generating acid upon heating | FUJIFILM CORPORATION (JP) | 2002-02-28 | — | — | US | disclosed |
| EP-1160095-A2 | Heat-sensitive composition and planographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2001-12-05 | — | — | EP | disclosed |