SCHEMBL5490794

SCHEMBL5490794

COc1ccccc1CCC[Si](Cl)(Cl)Cl

nearest known ligand 0.57

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 1/20 0.55
MTNR1A P48039 1/20 0.49
MTNR1B P49286 1/20 0.49
SIGMAR1 Q99720 1/20 0.49
AOC3 Q16853 1/20 0.49
MPO P05164 1/20 0.48
KCNH2 Q12809 1/20 0.47
ALDH1A1 P00352 1/20 0.47
GAA P10253 1/20 0.47
MAPT P10636 1/20 0.47
HRH3 Q9Y5N1 1/20 0.46
IDO1 P14902 1/20 0.46
ABCB1 P08183 1/20 0.45
CHRM2 P08172 1/20 0.44
CHRM1 P11229 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1970395 0.89 TAAR1 (0.58) TAAR1MTNR1AMTNR1BSIGMAR1AOC3
SCHEMBL8967162 0.88 TAAR1 (0.53) TAAR1MTNR1AMTNR1BSIGMAR1AOC3
SCHEMBL14469717 0.84 TAAR1 (0.56) TAAR1MTNR1AMTNR1BSIGMAR1AOC3
SCHEMBL9131260 0.83 TAAR1 (0.51) TAAR1MTNR1AMTNR1BSIGMAR1AOC3
SCHEMBL7831226 0.82 TAAR1 (0.69) TAAR1MTNR1AMTNR1BSIGMAR1AOC3
SCHEMBL15215220 0.81 TAAR1 (0.53) TAAR1MTNR1AMTNR1BSIGMAR1AOC3
SCHEMBL18100910 0.81 TAAR1 (0.53) TAAR1MTNR1AMTNR1BSIGMAR1AOC3
SCHEMBL7745016 0.79 TAAR1 (0.60) TAAR1MTNR1AMTNR1BSIGMAR1AOC3
SCHEMBL10124396 0.78 TAAR1 (0.50) TAAR1MTNR1AMTNR1BSIGMAR1AOC3
SCHEMBL7916831 0.78 TAAR1 (0.32) TAAR1MPO

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2016047988-A1 SURFACE MODIFIED BORON NITRIDE, COMPOSITION HAVING SAME DISPERSED THEREIN, AND WIRE COATED WITH THE COMPOSITION 세종대학교산학협력단 2016-03-31 WO disclosed
US-7291747-B2 Silicon compounds and process for preparation thereof CHISSO CORPORATION (JP) 2007-11-06 US disclosed
US-20040143081-A1 Novel silicon compounds and process for preparation thereof JNC CORPORATION (JP) 2004-07-22 US disclosed
US-5612170-A SILICONE, PHOTO ACID GENERATOR, DISSOLUTION INHIBITOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 1997-03-18 US disclosed