⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL272918 | 0.77 | — | — | |
| SCHEMBL21641950 | 0.77 | — | — | |
| SCHEMBL21641955 | 0.75 | — | — | |
| SCHEMBL28916774 | 0.75 | — | — | |
| SCHEMBL27167203 | 0.70 | — | — | |
| SCHEMBL28916754 | 0.66 | — | — | |
| SCHEMBL5792942 | 0.66 | — | — | |
| SCHEMBL3099423 | 0.66 | — | — | |
| SCHEMBL21641947 | 0.65 | — | — | |
| SCHEMBL21641959 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024247513-A1 | POROUS MOLDED BODY AND GAS ADSORBENT | ＡＧＣ株式会社 | 2024-12-05 | — | — | WO | disclosed |
| WO-2024085046-A1 | CARBON DIOXIDE ADSORBENT | ＡＧＣ株式会社 | 2024-04-25 | — | — | WO | disclosed |
| US-9890183-B2 | Aminosilicone solvent recovery methods and systems | GENERAL ELECTRIC COMPANY (US) | 2018-02-13 | — | — | US | disclosed |
| US-20170158717-A1 | AMINOSILICONE SOLVENT RECOVERY METHODS AND SYSTEMS | GENERAL ELECTRIC COMPANY (US) | 2017-06-08 | — | — | US | disclosed |
| US-20130052109-A1 | COMPOSITIONS FOR ABSORBING CARBON DIOXIDE, AND RELATED PROCESSES AND SYSTEMS | GENERAL ELECTRIC COMPANY (US) | 2013-02-28 | — | — | US | disclosed |
| WO-2013028391-A1 | COMPOSITIONS FOR ABSORBING CARBON DIOXIDE, AND RELATED PROCESSES AND SYSTEMS | GENERAL ELECTRIC COMPANY (US) | 2013-02-28 | — | — | WO | disclosed |
| US-7194956-B2 | Offset printing method and printing apparatus using heat and light to make a printing plate hydrophilic and hydrophobic | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-27 | — | — | US | disclosed |
| EP-1302313-B1 | Lithographic printing plate precursor | FUJI PHOTO FILM CO LTD (JP) | 2006-12-13 | — | — | EP | disclosed |
| US-20060156941-A1 | Planographic printing method, original printing plate and printing press | FUJI PHOTO FILM CO., LTD. | 2006-07-20 | — | — | US | disclosed |
| US-7032514-B2 | Planographic printing method, original printing plate and printing press | FUJI PHOTO FILM CO., LTD. (JP) | 2006-04-25 | — | — | US | disclosed |
| US-6892640-B2 | Offset printing method and printing apparatus using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2005-05-17 | — | — | US | disclosed |
| US-20050028698-A1 | Offset printing method and printing apparatus using the same | FUJI PHOTO FILM CO., LTD. | 2005-02-10 | — | — | US | disclosed |
| US-6852469-B2 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2005-02-08 | — | — | US | disclosed |
| US-6833225-B2 | Lithographic printing method and lithographic printing apparatus thereof | FUJI PHOTO FILM CO., LTD. (JP) | 2004-12-21 | — | — | US | disclosed |
| US-6694880-B1 | USING MATERIAL BEING HYDROPHILIC AT ONE TEMPERATURE AND HYDROPHOBIC AT ANOTHER | FUJI PHOTO FILM CO., LTD. (JP) | 2004-02-24 | — | — | US | disclosed |
| US-20030113666-A1 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. | 2003-06-19 | — | — | US | disclosed |
| EP-1302313-A2 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2003-04-16 | — | — | EP | disclosed |
| US-20020121206-A1 | Lithographic printing method and lithographic printing apparatus thereof | FUJI PHOTO FILM CO., LTD. | 2002-09-05 | — | — | US | disclosed |
| US-20020001776-A1 | Planographic printing method, original printing plate and printing press | FUJI PHOTO FILM CO., LTD. | 2002-01-03 | — | — | US | disclosed |