Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 10/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1012047 | 0.80 | KDM4E (0.48) | KDM4EALDH1A1TSHRTDP1MEN1 | |
| SCHEMBL3869621 | 0.80 | KDM4E (0.40) | KDM4EALDH1A1TSHRTDP1MEN1 | |
| SCHEMBL339490 | 0.79 | KDM4E (0.42) | KDM4EALDH1A1TSHRTDP1MEN1 | |
| SCHEMBL19689468 | 0.76 | KDM4E (0.46) | KDM4EALDH1A1TSHRTDP1MEN1 | |
| SCHEMBL1975023 | 0.76 | KDM4E (0.46) | KDM4EALDH1A1TSHRTDP1MEN1 | |
| SCHEMBL30996063 | 0.74 | KDM4E (0.44) | KDM4EALDH1A1TSHRTDP1MEN1 | |
| SCHEMBL4445579 | 0.74 | KDM4E (0.44) | KDM4EALDH1A1TSHRTDP1MEN1 | |
| SCHEMBL3871315 | 0.73 | KDM4E (0.38) | KDM4EALDH1A1TSHRMEN1KMT2A | |
| SCHEMBL12112124 | 0.72 | KDM4E (0.43) | KDM4EALDH1A1TSHRTDP1MEN1 | |
| SCHEMBL17311933 | 0.72 | KDM4E (0.43) | KDM4EALDH1A1TSHRTDP1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7232639-B2 | Monomer having fluorine-containing acetal or ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the same | NEC CORPORATION (JP) | 2007-06-19 | — | — | US | disclosed |
| US-20050164119-A1 | Monomer having fluorine-containing acetalor ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the same | NEC CORPORATION (JP) | 2005-07-28 | — | — | US | disclosed |