Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.64 |
| ▸ | TSHR | P16473 | 4/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | MGAM | O43451 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | SI | P14410 | 1/20 | 0.37 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.37 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.35 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | MMP1 | P03956 | 1/20 | 0.32 |
| ▸ | MMP2 | P08253 | 1/20 | 0.32 |
| ▸ | MMP3 | P08254 | 1/20 | 0.32 |
| ▸ | MMP9 | P14780 | 1/20 | 0.32 |
| ▸ | MMP13 | P45452 | 1/20 | 0.32 |
| ▸ | FOLH1 | Q04609 | 1/20 | 0.32 |
| ▸ | KCNA5 | P22460 | 1/20 | 0.32 |
| ▸ | TGFBR1 | P36897 | 1/20 | 0.31 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6043806 | 0.93 | TDP1 (0.50) | TDP1TSHRHSD17B10MGAMGAA | |
| SCHEMBL11417337 | 0.92 | TDP1 (0.54) | TDP1TSHRSMN1; SMN2HSD17B10MGAM | |
| SCHEMBL21427132 | 0.84 | TDP1 (0.42) | TDP1TSHRSMN1; SMN2HSD17B10MGAM | |
| SCHEMBL19035870 | 0.84 | TDP1 (0.42) | TDP1TSHRSMN1; SMN2HSD17B10MGAM | |
| SCHEMBL17323230 | 0.82 | SLC1A1 (0.43) | TDP1TSHRSMN1; SMN2HSD17B10MGAM | |
| SCHEMBL499437 | 0.81 | TDP1 (0.70) | TDP1TSHRSMN1; SMN2SLC22A6MMP1 | |
| SCHEMBL3500866 | 0.80 | TSHR (0.39) | TDP1TSHRSMN1; SMN2HSD17B10MGAM | |
| SCHEMBL22151 | 0.80 | TDP1 (1.00) | TDP1TSHRSMN1; SMN2SLC22A6FOLH1 | |
| SCHEMBL17517216 | 0.80 | TDP1 (1.00) | TDP1TSHRSMN1; SMN2SLC22A6FOLH1 | |
| SCHEMBL16925719 | 0.80 | TDP1 (1.00) | TDP1TSHRSMN1; SMN2SLC22A6FOLH1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4257623-B1 | PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE | MITSUBISHI GAS CHEMICAL CO (JP) | 2026-05-27 | — | — | EP | disclosed |
| US-12441842-B2 | Polyimide resin, photosensitive resin composition, resin film, and electronic device | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-10-14 | — | — | US | disclosed |
| CN-114945621-B | Polyimide resin, photosensitive resin composition, resin film, and electronic device | 三菱瓦斯化学株式会社 | 2024-07-02 | — | — | CN | disclosed |
| CN-113892058-B | Photosensitive resin composition and cured film thereof | 三菱瓦斯化学株式会社 | 2024-05-14 | — | — | CN | disclosed |
| US-20240085789-A1 | PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-03-14 | — | — | US | disclosed |
| US-20240027907-A1 | METHOD FOR PRODUCING PATTERNED SUBSTRATE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20230407089-A1 | PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-12-21 | — | — | US | disclosed |
| EP-4257622-A1 | PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-10-11 | — | — | EP | disclosed |
| EP-4257623-A1 | PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-10-11 | — | — | EP | disclosed |
| EP-4257621-A1 | METHOD FOR PRODUCING PATTERNED SUBSTRATE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-10-11 | — | — | EP | disclosed |
| EP-3978549-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM THEREOF | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-04-06 | — | — | EP | disclosed |
| WO-2022004290-A1 | CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD FOR MANUFACTURING PLATING MOLD-ATTACHED SUBSTRATE, AND METHOD FOR MANUFACTURING PLATED OBJECT | 東京応化工業株式会社 | 2022-01-06 | — | — | WO | disclosed |
| WO-2021140845-A1 | POLYIMIDE RESIN, PHOTOSENSITIVE RESIN COMPOSITION, RESIN FILM, AND ELECTRONIC DEVICE | 三菱瓦斯化学株式会社 | 2021-07-15 | — | — | WO | disclosed |
| WO-2020246349-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM THEREOF | 三菱瓦斯化学株式会社 | 2020-12-10 | — | — | WO | disclosed |
| EP-2777929-B1 | METHOD FOR MANUFACTURING TRANSPARENT, HEAT-RESISTANT GAS-BARRIER FILM | MITSUBISHI GAS CHEMICAL CO (JP) | 2016-10-19 | — | — | EP | disclosed |
| US-9073297-B2 | Method for manufacturing transparent, heat-resistant gas-barrier film | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-07-07 | — | — | US | disclosed |
| US-20140322444-A1 | METHOD FOR MANUFACTURING TRANSPARENT, HEAT-RESISTANT GAS-BARRIER FILM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-10-30 | — | — | US | disclosed |
| EP-2777929-A1 | METHOD FOR MANUFACTURING TRANSPARENT, HEAT-RESISTANT GAS-BARRIER FILM | Mitsubishi Gas Chemical Company, Inc. (JP) | 2014-09-17 | — | — | EP | disclosed |
| US-8642181-B2 | Metal-clad white laminate | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-02-04 | — | — | US | disclosed |
| US-20070292709-A1 | Metal-Clad White Laminate | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2007-12-20 | — | — | US | disclosed |