⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4320983 | 0.82 | — | — | |
| SCHEMBL27634091 | 0.77 | — | — | |
| SCHEMBL1138473 | 0.74 | — | — | |
| SCHEMBL10934722 | 0.74 | CA2 (0.35) | — | |
| SCHEMBL28115939 | 0.71 | — | — | |
| Butadiene SCHEMBL2778686 | 0.70 | — | — | |
| SCHEMBL4624266 | 0.70 | — | — | |
| SCHEMBL11695850 | 0.69 | CYP3A4 (0.37) | — | |
| SCHEMBL31287 | 0.69 | — | — | |
| Bromide SCHEMBL2760797 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7194956-B2 | Offset printing method and printing apparatus using heat and light to make a printing plate hydrophilic and hydrophobic | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-27 | — | — | US | disclosed |
| EP-1020304-B1 | Offset printing method and printing apparatus using the same | FUJI PHOTO FILM CO LTD (JP) | 2006-04-05 | — | — | EP | disclosed |
| US-6892640-B2 | Offset printing method and printing apparatus using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2005-05-17 | — | — | US | disclosed |
| US-20050028698-A1 | Offset printing method and printing apparatus using the same | FUJI PHOTO FILM CO., LTD. | 2005-02-10 | — | — | US | disclosed |
| US-6833225-B2 | Lithographic printing method and lithographic printing apparatus thereof | FUJI PHOTO FILM CO., LTD. (JP) | 2004-12-21 | — | — | US | disclosed |
| US-20040134366-A1 | Offset printing method and printing apparatus using the same | FUJI PHOTO FILM CO., LTD. | 2004-07-15 | — | — | US | disclosed |
| US-6694880-B1 | USING MATERIAL BEING HYDROPHILIC AT ONE TEMPERATURE AND HYDROPHOBIC AT ANOTHER | FUJI PHOTO FILM CO., LTD. (JP) | 2004-02-24 | — | — | US | disclosed |
| US-20020121206-A1 | Lithographic printing method and lithographic printing apparatus thereof | FUJI PHOTO FILM CO., LTD. | 2002-09-05 | — | — | US | disclosed |
| EP-1020304-A2 | Offset printing method and printing apparatus using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2000-07-19 | — | — | EP | disclosed |
| US-4226793-A | Process for the manufacture of monomeric and oligomeric silicic acid esters | DYNAMIT NOBEL AKTIENGESELLSCHAFT (DE) | 1980-10-07 | — | — | US | disclosed |