⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1226402 | 0.76 | — | — | |
| SCHEMBL17138329 | 0.76 | — | — | |
| SCHEMBL704241 | 0.70 | — | — | |
| SCHEMBL707721 | 0.67 | — | — | |
| SCHEMBL8422091 | 0.67 | — | — | |
| SCHEMBL704695 | 0.67 | — | — | |
| SCHEMBL263794 | 0.64 | — | — | |
| SCHEMBL190848 | 0.61 | — | — | |
| SCHEMBL134582 | 0.61 | — | — | |
| SCHEMBL37498 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250060673-A1 | DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS | LAM RES CORP (US) | 2025-02-20 | — | — | US | claimed |
| WO-2023115023-A1 | DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS | LAM RESEARCH CORPORATION (US) | 2023-06-22 | — | — | WO | claimed |
| US-20250060673-A1 | DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS | LAM RES CORP (US) | 2025-02-20 | — | — | US | disclosed |
| WO-2023115023-A1 | DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS | LAM RESEARCH CORPORATION (US) | 2023-06-22 | — | — | WO | disclosed |
| CN-104974184-B | preparation of silazane Compounds | 信越化学工业株式会社 | 2019-12-06 | — | — | CN | disclosed |
| EP-2930177-B1 | PREPARATION OF SILAZANE COMPOUND | SHINETSU CHEMICAL CO (JP) | 2018-04-25 | — | — | EP | disclosed |
| US-9416147-B2 | Preparation of silazane compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-16 | — | — | US | disclosed |
| EP-2508504-B1 | PROCESS FOR PREPARATION OF CYCLOALKANEDICARBOXYLIC ACID MONOESTERS | SUMITOMO CHEMICAL CO (JP) | 2016-04-13 | — | — | EP | disclosed |
| EP-2930177-A1 | Preparation of silazane compound | Shin-Etsu Chemical Co., Ltd. (JP) | 2015-10-14 | — | — | EP | disclosed |
| US-20150284414-A1 | PREPARATION OF SILAZANE COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-08 | — | — | US | disclosed |
| EP-2508504-A1 | PROCESS FOR PREPARATION OF CYCLOALKANEDICARBOXYLIC ACID MONOESTERS | Sumitomo Chemical Co., Ltd (JP) | 2012-10-10 | — | — | EP | disclosed |
| EP-1095947-B1 | NOVEL ANTIBACTERIAL COMPOUNDS | SANKYO CO (JP) | 2007-03-14 | — | — | EP | disclosed |
| US-6844173-B2 | Strain of Streptomyces griseus | SANKYO COMPANY, LIMITED (JP) | 2005-01-18 | — | — | US | disclosed |
| EP-1319666-A1 | Novel antibacterial compounds | Sankyo Company, Limited (JP) | 2003-06-18 | — | — | EP | disclosed |
| EP-1319406-A1 | Novel antibacterial compounds | Sankyo Company, Limited (JP) | 2003-06-18 | — | — | EP | disclosed |
| US-20030069204-A1 | Strain of streptomyces | SANKYO COMPANY LIMITED (JP) | 2003-04-10 | — | — | US | disclosed |
| US-20030055297-A1 | An alkyl, cycloalkyl, arylalkyl dihydroxy compound useful as intermediates; a cost-effective preparation | ABBOTT LABORATORIES | 2003-03-20 | — | — | US | disclosed |
| US-6472384-B1 | Antimicrobial compounds | SANKYO COMPANY, LIMITED (JP) | 2002-10-29 | — | — | US | disclosed |
| WO-2002081441-A1 | PROCESS FOR THE PREPARATION OF SUBSTITUTED PYRROLIDINE NEURAMINIDASE INHIBITORS | ABBOTT LABORATORIES (US) | 2002-10-17 | — | — | WO | disclosed |
| EP-1095947-A1 | NOVEL ANTIBACTERIAL COMPOUNDS | Sankyo Company Limited (JP) | 2001-05-02 | — | — | EP | disclosed |